The characterization of hydrogenated amorphous silicon and epitaxial silicon thin films grown on crystalline silicon substrates by using spectroscopic ellipsometry

Wu Chen-Yang; Gu Jin-Hua; Feng Ya-Yang; Xue Yuan; Lu Jing-Xiao

doi:10.7498/aps.61.157803

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Wu Chen-Yang, Gu Jin-Hua, Feng Ya-Yang, Xue Yuan, Lu Jing-Xiao. The characterization of hydrogenated amorphous silicon and epitaxial silicon thin films grown on crystalline silicon substrates by using spectroscopic ellipsometryJ. Acta Physica Sinica, 2012, 61(15): 157803. DOI: 10.7498/aps.61.157803

Citation:

Wu Chen-Yang, Gu Jin-Hua, Feng Ya-Yang, Xue Yuan, Lu Jing-Xiao. The characterization of hydrogenated amorphous silicon and epitaxial silicon thin films grown on crystalline silicon substrates by using spectroscopic ellipsometryJ. Acta Physica Sinica, 2012, 61(15): 157803. DOI: 10.7498/aps.61.157803

Citation:

Wu Chen-Yang, Gu Jin-Hua, Feng Ya-Yang, Xue Yuan, Lu Jing-Xiao. The characterization of hydrogenated amorphous silicon and epitaxial silicon thin films grown on crystalline silicon substrates by using spectroscopic ellipsometryJ. Acta Physica Sinica, 2012, 61(15): 157803. DOI: 10.7498/aps.61.157803