The optimization of lithography process on the deep muti-stepped surface

Sun Li-Yuan; Gao Zhi-Yuan; Zou De-Shu; Zhang Lu; Ma Li; Tian Liang; Shen Guang-Di

doi:10.7498/aps.61.206801

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Sun Li-Yuan, Gao Zhi-Yuan, Zou De-Shu, Zhang Lu, Ma Li, Tian Liang, Shen Guang-Di. The optimization of lithography process on the deep muti-stepped surfaceJ. Acta Physica Sinica, 2012, 61(20): 206801. DOI: 10.7498/aps.61.206801

Citation:

Sun Li-Yuan, Gao Zhi-Yuan, Zou De-Shu, Zhang Lu, Ma Li, Tian Liang, Shen Guang-Di. The optimization of lithography process on the deep muti-stepped surfaceJ. Acta Physica Sinica, 2012, 61(20): 206801. DOI: 10.7498/aps.61.206801

Citation:

Sun Li-Yuan, Gao Zhi-Yuan, Zou De-Shu, Zhang Lu, Ma Li, Tian Liang, Shen Guang-Di. The optimization of lithography process on the deep muti-stepped surfaceJ. Acta Physica Sinica, 2012, 61(20): 206801. DOI: 10.7498/aps.61.206801