Passivation and stability of thermal atomic layer deposited Al2O3 on CZ-Si

He Yue; Dou Ya-Nan; Ma Xiao-Guang; Chen Shao-Bin; Chu Jun-Hao

doi:10.7498/aps.61.248102

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He Yue, Dou Ya-Nan, Ma Xiao-Guang, Chen Shao-Bin, Chu Jun-Hao. Passivation and stability of thermal atomic layer deposited Al2O3 on CZ-SiJ. Acta Physica Sinica, 2012, 61(24): 248102. DOI: 10.7498/aps.61.248102

Citation:

He Yue, Dou Ya-Nan, Ma Xiao-Guang, Chen Shao-Bin, Chu Jun-Hao. Passivation and stability of thermal atomic layer deposited Al2O3 on CZ-SiJ. Acta Physica Sinica, 2012, 61(24): 248102. DOI: 10.7498/aps.61.248102

Citation:

He Yue, Dou Ya-Nan, Ma Xiao-Guang, Chen Shao-Bin, Chu Jun-Hao. Passivation and stability of thermal atomic layer deposited Al2O3 on CZ-SiJ. Acta Physica Sinica, 2012, 61(24): 248102. DOI: 10.7498/aps.61.248102