Low-temperature growth of AlN thin films by plasma-enhanced atomic layer deposition

Feng Jia-Heng; Tang Li-Dan; Liu Bang-Wu; Xia Yang; Wang Bing

doi:10.7498/aps.62.117302

Search

x

Feng Jia-Heng, Tang Li-Dan, Liu Bang-Wu, Xia Yang, Wang Bing. Low-temperature growth of AlN thin films by plasma-enhanced atomic layer depositionJ. Acta Physica Sinica, 2013, 62(11): 117302. DOI: 10.7498/aps.62.117302

Citation:

Feng Jia-Heng, Tang Li-Dan, Liu Bang-Wu, Xia Yang, Wang Bing. Low-temperature growth of AlN thin films by plasma-enhanced atomic layer depositionJ. Acta Physica Sinica, 2013, 62(11): 117302. DOI: 10.7498/aps.62.117302

Citation:

Feng Jia-Heng, Tang Li-Dan, Liu Bang-Wu, Xia Yang, Wang Bing. Low-temperature growth of AlN thin films by plasma-enhanced atomic layer depositionJ. Acta Physica Sinica, 2013, 62(11): 117302. DOI: 10.7498/aps.62.117302