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中国物理学会期刊
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Xu Xiang-Dong, Liu Ying, Qiu Ke-Qiang, Liu Zheng-Kun, Hong Yi-Lin, Fu Shao-Jun. Ion beam etching for multilayer dielectric pulse compressor gratings with top layers of HfO2J. Acta Physica Sinica, 2013, 62(23): 234202. DOI: 10.7498/aps.62.234202
Citation: Xu Xiang-Dong, Liu Ying, Qiu Ke-Qiang, Liu Zheng-Kun, Hong Yi-Lin, Fu Shao-Jun. Ion beam etching for multilayer dielectric pulse compressor gratings with top layers of HfO2J. Acta Physica Sinica, 2013, 62(23): 234202. DOI: 10.7498/aps.62.234202
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Ion beam etching for multilayer dielectric pulse compressor gratings with top layers of HfO2

Acta Phys. Sin., 2013, 62(23): 234202.
DOI: 10.7498/aps.62.234202
CSTR: 32037.14.aps.62.234202
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