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Zhou Da-Yu, Xu Jin. Ferroelectric and antiferroelectric properties of Si-doped HfO2 thin filmsJ. Acta Physica Sinica, 2014, 63(11): 117703. DOI: 10.7498/aps.63.117703
Citation: Zhou Da-Yu, Xu Jin. Ferroelectric and antiferroelectric properties of Si-doped HfO2 thin filmsJ. Acta Physica Sinica, 2014, 63(11): 117703. DOI: 10.7498/aps.63.117703
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Ferroelectric and antiferroelectric properties of Si-doped HfO2 thin films

Acta Phys. Sin., 2014, 63(11): 117703.
DOI: 10.7498/aps.63.117703
CSTR: 32037.14.aps.63.117703
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