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中国物理学会期刊
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He Su-Ming, Dai Shan-Shan, Luo Xiang-Dong, Zhang Bo, Wang Jin-Bin. Preparation of SiON film by plasma enhanced chemical vapor deposition and passivation on SiJ. Acta Physica Sinica, 2014, 63(12): 128102. DOI: 10.7498/aps.63.128102
Citation: He Su-Ming, Dai Shan-Shan, Luo Xiang-Dong, Zhang Bo, Wang Jin-Bin. Preparation of SiON film by plasma enhanced chemical vapor deposition and passivation on SiJ. Acta Physica Sinica, 2014, 63(12): 128102. DOI: 10.7498/aps.63.128102
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Preparation of SiON film by plasma enhanced chemical vapor deposition and passivation on Si

Acta Phys. Sin., 2014, 63(12): 128102.
DOI: 10.7498/aps.63.128102
CSTR: 32037.14.aps.63.128102
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