Study on the annealing growth of Ge dots at high deposition rate by using magnetron sputtering technique

Zhang Xin-Xin; Jin Ying-Xia; Ye Xiao-Song; Wang Chong; Yang Yu

doi:10.7498/aps.63.156802

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Zhang Xin-Xin, Jin Ying-Xia, Ye Xiao-Song, Wang Chong, Yang Yu. Study on the annealing growth of Ge dots at high deposition rate by using magnetron sputtering techniqueJ. Acta Physica Sinica, 2014, 63(15): 156802. DOI: 10.7498/aps.63.156802

Citation:

Zhang Xin-Xin, Jin Ying-Xia, Ye Xiao-Song, Wang Chong, Yang Yu. Study on the annealing growth of Ge dots at high deposition rate by using magnetron sputtering techniqueJ. Acta Physica Sinica, 2014, 63(15): 156802. DOI: 10.7498/aps.63.156802

Citation:

Zhang Xin-Xin, Jin Ying-Xia, Ye Xiao-Song, Wang Chong, Yang Yu. Study on the annealing growth of Ge dots at high deposition rate by using magnetron sputtering techniqueJ. Acta Physica Sinica, 2014, 63(15): 156802. DOI: 10.7498/aps.63.156802