Zhang Jin-Shuai, Huang Qiu-Shi, Jiang Li, Qi Run-Ze, Yang Yang, Wang Feng-Li, Zhang Zhong, Wang Zhan-Shan. Stress and structure properties of X-ray W/Si multilayer under low temperature annealingJ. Acta Physica Sinica, 2016, 65(8): 086101. DOI: 10.7498/aps.65.086101
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Citation:
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Zhang Jin-Shuai, Huang Qiu-Shi, Jiang Li, Qi Run-Ze, Yang Yang, Wang Feng-Li, Zhang Zhong, Wang Zhan-Shan. Stress and structure properties of X-ray W/Si multilayer under low temperature annealingJ. Acta Physica Sinica, 2016, 65(8): 086101. DOI: 10.7498/aps.65.086101
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Zhang Jin-Shuai, Huang Qiu-Shi, Jiang Li, Qi Run-Ze, Yang Yang, Wang Feng-Li, Zhang Zhong, Wang Zhan-Shan. Stress and structure properties of X-ray W/Si multilayer under low temperature annealingJ. Acta Physica Sinica, 2016, 65(8): 086101. DOI: 10.7498/aps.65.086101
|
Citation:
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Zhang Jin-Shuai, Huang Qiu-Shi, Jiang Li, Qi Run-Ze, Yang Yang, Wang Feng-Li, Zhang Zhong, Wang Zhan-Shan. Stress and structure properties of X-ray W/Si multilayer under low temperature annealingJ. Acta Physica Sinica, 2016, 65(8): 086101. DOI: 10.7498/aps.65.086101
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