Tang Hua-Lian, Xu Bei-Lei, Zhuang Yi-Qi, Zhang Li, Li Cong. Distribution characteristic of p-channel metal-oxide-semiconductor negative bias temperature instability effect under process variationsJ. Acta Physica Sinica, 2016, 65(16): 168502. DOI: 10.7498/aps.65.168502
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Citation:
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Tang Hua-Lian, Xu Bei-Lei, Zhuang Yi-Qi, Zhang Li, Li Cong. Distribution characteristic of p-channel metal-oxide-semiconductor negative bias temperature instability effect under process variationsJ. Acta Physica Sinica, 2016, 65(16): 168502. DOI: 10.7498/aps.65.168502
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Tang Hua-Lian, Xu Bei-Lei, Zhuang Yi-Qi, Zhang Li, Li Cong. Distribution characteristic of p-channel metal-oxide-semiconductor negative bias temperature instability effect under process variationsJ. Acta Physica Sinica, 2016, 65(16): 168502. DOI: 10.7498/aps.65.168502
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Citation:
|
Tang Hua-Lian, Xu Bei-Lei, Zhuang Yi-Qi, Zhang Li, Li Cong. Distribution characteristic of p-channel metal-oxide-semiconductor negative bias temperature instability effect under process variationsJ. Acta Physica Sinica, 2016, 65(16): 168502. DOI: 10.7498/aps.65.168502
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