Zhang Zhi-Chao, Wang Fang, Wu Shi-Jian, Li Yi, Mi Wei, Zhao Jin-Shi, Zhang Kai-Liang. Influneces of different oxygen partial pressures on switching properties of Ni/HfOx/TiN resistive switching devicesJ. Acta Physica Sinica, 2018, 67(5): 057301. DOI: 10.7498/aps.67.20172194
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Citation:
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Zhang Zhi-Chao, Wang Fang, Wu Shi-Jian, Li Yi, Mi Wei, Zhao Jin-Shi, Zhang Kai-Liang. Influneces of different oxygen partial pressures on switching properties of Ni/HfOx/TiN resistive switching devicesJ. Acta Physica Sinica, 2018, 67(5): 057301. DOI: 10.7498/aps.67.20172194
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Zhang Zhi-Chao, Wang Fang, Wu Shi-Jian, Li Yi, Mi Wei, Zhao Jin-Shi, Zhang Kai-Liang. Influneces of different oxygen partial pressures on switching properties of Ni/HfOx/TiN resistive switching devicesJ. Acta Physica Sinica, 2018, 67(5): 057301. DOI: 10.7498/aps.67.20172194
|
Citation:
|
Zhang Zhi-Chao, Wang Fang, Wu Shi-Jian, Li Yi, Mi Wei, Zhao Jin-Shi, Zhang Kai-Liang. Influneces of different oxygen partial pressures on switching properties of Ni/HfOx/TiN resistive switching devicesJ. Acta Physica Sinica, 2018, 67(5): 057301. DOI: 10.7498/aps.67.20172194
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