Gap length effect on discharge mode and etching profiles in asymmetric dual frequency capacitive CF<sub>4</sub>/Ar discharges

Dong Wan; Xu Hai-Wen; Dai Zhong-Ling; Song Yuan-Hong; Wang You-Nian

doi:10.7498/aps.70.20210546

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Dong Wan, Xu Hai-Wen, Dai Zhong-Ling, Song Yuan-Hong, Wang You-Nian. Gap length effect on discharge mode and etching profiles in asymmetric dual frequency capacitive CF4/Ar dischargesJ. Acta Physica Sinica, 2021, 70(9): 095213. DOI: 10.7498/aps.70.20210546

Citation:

Dong Wan, Xu Hai-Wen, Dai Zhong-Ling, Song Yuan-Hong, Wang You-Nian. Gap length effect on discharge mode and etching profiles in asymmetric dual frequency capacitive CF4/Ar dischargesJ. Acta Physica Sinica, 2021, 70(9): 095213. DOI: 10.7498/aps.70.20210546

Citation:

Dong Wan, Xu Hai-Wen, Dai Zhong-Ling, Song Yuan-Hong, Wang You-Nian. Gap length effect on discharge mode and etching profiles in asymmetric dual frequency capacitive CF4/Ar dischargesJ. Acta Physica Sinica, 2021, 70(9): 095213. DOI: 10.7498/aps.70.20210546