Numerical investigation of SiO<sub>2</sub> film deposition enhanced  by capacitively coupled discharge plasma

Song Liu-Qin; Jia Wen-Zhu; Dong Wan; Zhang Yi-Fan; Dai Zhong-Ling; Song Yuan-Hong

doi:10.7498/aps.71.20220493

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Song Liu-Qin, Jia Wen-Zhu, Dong Wan, Zhang Yi-Fan, Dai Zhong-Ling, Song Yuan-Hong. Numerical investigation of SiO2 film deposition enhanced by capacitively coupled discharge plasmaJ. Acta Physica Sinica, 2022, 71(17): 170201. DOI: 10.7498/aps.71.20220493

Citation:

Song Liu-Qin, Jia Wen-Zhu, Dong Wan, Zhang Yi-Fan, Dai Zhong-Ling, Song Yuan-Hong. Numerical investigation of SiO2 film deposition enhanced by capacitively coupled discharge plasmaJ. Acta Physica Sinica, 2022, 71(17): 170201. DOI: 10.7498/aps.71.20220493

Citation:

Song Liu-Qin, Jia Wen-Zhu, Dong Wan, Zhang Yi-Fan, Dai Zhong-Ling, Song Yuan-Hong. Numerical investigation of SiO2 film deposition enhanced by capacitively coupled discharge plasmaJ. Acta Physica Sinica, 2022, 71(17): 170201. DOI: 10.7498/aps.71.20220493