Structure, performance regulation and typical device applications of HfO<sub>2</sub>-based ferroelectric films

Yuan Guo-Liang; Wang Chen-Hao; Tang Wen-Bin; Zhang Rui; Lu Xu-Bing

doi:10.7498/aps.72.20222221

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Yuan Guo-Liang, Wang Chen-Hao, Tang Wen-Bin, Zhang Rui, Lu Xu-Bing. Structure, performance regulation and typical device applications of HfO2-based ferroelectric filmsJ. Acta Physica Sinica, 2023, 72(9): 097703. DOI: 10.7498/aps.72.20222221

Citation:

Yuan Guo-Liang, Wang Chen-Hao, Tang Wen-Bin, Zhang Rui, Lu Xu-Bing. Structure, performance regulation and typical device applications of HfO2-based ferroelectric filmsJ. Acta Physica Sinica, 2023, 72(9): 097703. DOI: 10.7498/aps.72.20222221

Citation:

Yuan Guo-Liang, Wang Chen-Hao, Tang Wen-Bin, Zhang Rui, Lu Xu-Bing. Structure, performance regulation and typical device applications of HfO2-based ferroelectric filmsJ. Acta Physica Sinica, 2023, 72(9): 097703. DOI: 10.7498/aps.72.20222221