Three-dimensional fluid simulation of a planar coil inductively coupled argon plasma source for semiconductor processes

Zhao Ming-Liang; Xing Si-Yu; Tang Wen; Zhang Yu-Ru; Gao Fei; Wang You-Nian

doi:10.7498/aps.73.20240952

Search

x

Zhao Ming-Liang, Xing Si-Yu, Tang Wen, Zhang Yu-Ru, Gao Fei, Wang You-Nian. Three-dimensional fluid simulation of a planar coil inductively coupled argon plasma source for semiconductor processesJ. Acta Physica Sinica, 2024, 73(21): 215201. DOI: 10.7498/aps.73.20240952

Citation:

Zhao Ming-Liang, Xing Si-Yu, Tang Wen, Zhang Yu-Ru, Gao Fei, Wang You-Nian. Three-dimensional fluid simulation of a planar coil inductively coupled argon plasma source for semiconductor processesJ. Acta Physica Sinica, 2024, 73(21): 215201. DOI: 10.7498/aps.73.20240952

Citation:

Zhao Ming-Liang, Xing Si-Yu, Tang Wen, Zhang Yu-Ru, Gao Fei, Wang You-Nian. Three-dimensional fluid simulation of a planar coil inductively coupled argon plasma source for semiconductor processesJ. Acta Physica Sinica, 2024, 73(21): 215201. DOI: 10.7498/aps.73.20240952