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YIN Guiqin, ZHANG Leilei, TUO Sheng. Discharge characteristics of dual-frequency magnetized capacitively coupled Ar/CH4 plasmaJ. Acta Physica Sinica, 2025, 74(14): 145201. DOI: 10.7498/aps.74.20250244
Citation: YIN Guiqin, ZHANG Leilei, TUO Sheng. Discharge characteristics of dual-frequency magnetized capacitively coupled Ar/CH4 plasmaJ. Acta Physica Sinica, 2025, 74(14): 145201. DOI: 10.7498/aps.74.20250244
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Discharge characteristics of dual-frequency magnetized capacitively coupled Ar/CH4 plasma

Acta Phys. Sin., 2025, 74(14): 145201.
DOI: 10.7498/aps.74.20250244
CSTR: 32037.14.aps.74.20250244
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