Ion energy distribution modulation in radio frequency magnetron sputtering of indium tin oxide via auxiliary anode bias

HUANG Tianyuan; ZHAO Yifan; MO Chaochao; MEI Yang; ZHANG Xiaoman; JI Peiyu; WU Xuemei

doi:10.7498/aps.74.20251172

Search

x

HUANG Tianyuan, ZHAO Yifan, MO Chaochao, MEI Yang, ZHANG Xiaoman, JI Peiyu, WU Xuemei. Ion energy distribution modulation in radio frequency magnetron sputtering of indium tin oxide via auxiliary anode biasJ. Acta Physica Sinica, 2025, 74(23): 238501. DOI: 10.7498/aps.74.20251172

Citation:

HUANG Tianyuan, ZHAO Yifan, MO Chaochao, MEI Yang, ZHANG Xiaoman, JI Peiyu, WU Xuemei. Ion energy distribution modulation in radio frequency magnetron sputtering of indium tin oxide via auxiliary anode biasJ. Acta Physica Sinica, 2025, 74(23): 238501. DOI: 10.7498/aps.74.20251172

Citation:

HUANG Tianyuan, ZHAO Yifan, MO Chaochao, MEI Yang, ZHANG Xiaoman, JI Peiyu, WU Xuemei. Ion energy distribution modulation in radio frequency magnetron sputtering of indium tin oxide via auxiliary anode biasJ. Acta Physica Sinica, 2025, 74(23): 238501. DOI: 10.7498/aps.74.20251172