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A study on photoluminescence characterization of high-quality nanocrystalline ZnO thin films

Zhang Xi-Tian Xiao Zhi-Yan Zhang Wei-Li Gao Hong Wang Yu-Xi Liu Yi-Chun Zhang Ji-Ying Xu Wu

Citation:

A study on photoluminescence characterization of high-quality nanocrystalline ZnO thin films

Zhang Xi-Tian, Xiao Zhi-Yan, Zhang Wei-Li, Gao Hong, Wang Yu-Xi, Liu Yi-Chun, Zhang Ji-Ying, Xu Wu
cstr: 32037.14.aps.52.740
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  • In this paper, we report the photoluminescence from high-quality nanocrystalline ZnO thin films. The high-quality nanocrystalline ZnO thin films are prepared by thermal oxidation of ZnS films at 800℃, which are deposited by low-pressure metal-organic chemical vapor deposition technique. X-ray diffraction indicated that the nanocrystalline ZnO thin films have a polycrystalline hexagonal wurtzite structure. A strong ultraviolet emission peak at 3.26 eV was observed and the deep-level emission band was barely observable at room temperature. The strength (ΓLO) of the exciton-longitudinal-optical (LO)-phonon coupling is deduced from the temperature dependence of the full width at half maximum of the fundamental excitonic peak. ΓLO is reduced greatly due to the quantum confinement effect.
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Publishing process
  • Received Date:  16 April 2002
  • Accepted Date:  10 August 2002
  • Published Online:  03 April 2005
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