The design, fabrication and performance of a large area 10000 line/mm metal transmission diffraction gratings for soft X-ray

Zhu Wei-Zhong; Wu Yan-Qing; Guo Zhi; Zhu Xiao-Li; Ma Jie; Xie Chang-Qing; Shi Pei-Xiong; Zhou Hong-Jun; Huo Tong-Lin; Tai Ren-Zhong; Xu Hong-Jie

doi:10.7498/aps.57.6386

Abstract
Based on the rigorous coupled-wave analysis, the optimized design for a transmission two-gratings mask for 13.4nm soft X-ray interference lithography has been accomplished. Then a large area transmission gratings was successfully fabricated by electron beam lithography (EBL), which has an area of 1.5mm×1.5mm, ruling period of 100nm, Cr relief thickness of 50nm, gap/period of 0.6, and Si3N4 substrate thickness of 100nm. Based on the quantitative estimation of the measurement data, the first and second order diffraction efficiencies were determined as 4.41% and 0.49%, respectively， in good agreement with the numerical simulation results. Through comparison between the measurement and the numerical simulation results, it was shown that the relief is entirely vertical and the gap/period was well controlled. This two-grating mask will be used installed on the soft X-ray interference lithography endstation at Shanghai Synchrotron Radiation Facility (SSRF). With its 1st and 2nd order diffraction, 50nm period and 25nm period gratings can be cost-effectively fabricated, respectively.

Keywords:
soft X-ray metal transmission grating /

rigorous coupled-wave analysis /

diffraction efficiency /

soft X-ray interference lithography
Authors and contacts
Zhu Wei-Zhong⁴,

Wu Yan-Qing⁴,

Guo Zhi⁴,

Zhu Xiao-Li³,

Ma Jie³,

Xie Chang-Qing³,

Shi Pei-Xiong¹,

Zhou Hong-Jun²,

Huo Tong-Lin²,

Tai Ren-Zhong⁴,

Xu Hong-Jie⁴

(1)丹麦科技大学,哥本哈根 2800; (2)中国科技大学国家同步辐射实验室,合肥 230029; (3)中国科学院微电子研究所,北京 100029; (4)中科院上海应用物理研究所，上海 201800
References

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Vol. 57, Issue 10 - 2008-05-20

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