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In order to investigate the effects of the inner wall secondary electron emission on the performance of Hall thruster, a hydrodynamic model is used to study the characteristics of plasma sheath considering secondary electron magnetization. The Bohm criterion of the magnetized plasma sheath is obtained. The structures of plasma sheath in Hall thruster with different magnetic field magnitudes and directions, different secondary electron emission coefficients and different plasma species are discussed. Simulation results indicate that both particle density and wall potential increase while the sheath thickness decreases with the augment of secondary electron emission coefficient. The sheath potential and the particle density increase with the magnitude and azimuth angle of magnetic field increasing. Both the sheath thickness and the wall potential are different in different plasma species. These research results provide a theoretical explanation for the magnetism-ampere characteristic of the Hall thruster.
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Keywords:
- Hall thruster /
- magnetized sheath /
- secondary electron
[1] Mao G W, Han X W, Yang J 2000 J. Propul. Technol. 21 1 (in Chinese)[毛根旺、韩先伟、杨 涓 2000 推进技术 21 1]
[2] Racca G D, Marini A, Stagnaro L 2002 Planet. Space Sci. 50 1323
[3] [4] Zhurin V V, Kaufman H R, Robinson R S 1999 Plasma Sour. Sci. Technol. 8 1
[5] [6] Ashkenasy J,Raitses Y, Appelbaum G 1997 Second European Spacecraft Propulsion Conference (Paris: European Space Agency) pp455-460
[7] [8] Ahedo E, Gallardo J M, Martinez-Sanchez M 2003 Phys. Plasmas 10 3397
[9] [10] Yu D R, Zhang F K, Li H, Liu H 2009 Acta Phys. Sin. 58 1844 (in Chinese) [于达仁、张凤奎、李 鸿、刘 辉 2009 物理学报 58 1844]
[11] [12] [13] Geng S F, Tang D L, Zhao J, Qiu X M 2009 Acta Phys. Sin. 58 5520 (in Chinese)[耿少飞、唐德礼、赵 杰、邱孝明 2009 物理学报 58 5520]
[14] E P, Yu D R, Wu Z W, Han K 2009 Acta Phys. Sin. 58 2535(in Chinese)[鄂 鹏、于达仁、武志文、韩 轲 2009 物理学报 58 2535]
[15] [16] [17] Hobbs G D, Wesson J A 1967 Plasma Phys. 9 85
[18] [19] Ahedo E 2002 Phys. Plasmas 9 4340
[20] Ahedo E 1997 Phys. Plasmas 4 4419
[21] [22] Zou X, Liu J Y, Wang Z X, Gong Y, Liu Y, Wang X G 2004 Acta Phys. Sin. 53 3409 (in Chinese)[邹 秀、刘金远、王正汹、宫 野、刘 悦、王晓刚 2004 物理学报 53 3409]
[23] [24] [25] Liu J Y, Chen L, Wang F, Wang N, Duan P 2010 Acta Phys. Sin. 59 8692 (in Chinese)[刘金远、陈 龙、王 丰、王 楠、段 萍 2010 物理学报 59 8692]
[26] Wang Z X, Liu Y, Ren L W, Liu J Y, Wang X G 2006 Thin Solid Films 506 637
[27] [28] Duan P, Liu J Y, Gong Y, Liu Y, Wang X G 2007 Plasma Sci. Technol. 9 394
[29] [30] Yu D R, Qing S W, Wang X G, Ding Y J, Duan P 2011 Acta Phys. Sin. 60 025204(in Chinese)[于达仁、卿绍伟、王晓刚、丁永杰、段 萍 2011 物理学报 60 025204]
[31] [32] Xue Z H 2009 M. S. Dissertation (Dalian: Dalian University of Technology)(in Chinese)[薛忠华 2009 硕士学位论文 (大连: 大连理工大学)]
[33] [34] Lieberman M A, Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing (2nd ed) (New Jersey: John Wiley Sons) p31
[35] [36] [37] Chen F F 1974 Introduction to Plasma Physics (New York:Plenum) p156
[38] [39] Gascona N, Dudeck M, Barral S 2003 Phys. Plasmas 10 4123
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[1] Mao G W, Han X W, Yang J 2000 J. Propul. Technol. 21 1 (in Chinese)[毛根旺、韩先伟、杨 涓 2000 推进技术 21 1]
[2] Racca G D, Marini A, Stagnaro L 2002 Planet. Space Sci. 50 1323
[3] [4] Zhurin V V, Kaufman H R, Robinson R S 1999 Plasma Sour. Sci. Technol. 8 1
[5] [6] Ashkenasy J,Raitses Y, Appelbaum G 1997 Second European Spacecraft Propulsion Conference (Paris: European Space Agency) pp455-460
[7] [8] Ahedo E, Gallardo J M, Martinez-Sanchez M 2003 Phys. Plasmas 10 3397
[9] [10] Yu D R, Zhang F K, Li H, Liu H 2009 Acta Phys. Sin. 58 1844 (in Chinese) [于达仁、张凤奎、李 鸿、刘 辉 2009 物理学报 58 1844]
[11] [12] [13] Geng S F, Tang D L, Zhao J, Qiu X M 2009 Acta Phys. Sin. 58 5520 (in Chinese)[耿少飞、唐德礼、赵 杰、邱孝明 2009 物理学报 58 5520]
[14] E P, Yu D R, Wu Z W, Han K 2009 Acta Phys. Sin. 58 2535(in Chinese)[鄂 鹏、于达仁、武志文、韩 轲 2009 物理学报 58 2535]
[15] [16] [17] Hobbs G D, Wesson J A 1967 Plasma Phys. 9 85
[18] [19] Ahedo E 2002 Phys. Plasmas 9 4340
[20] Ahedo E 1997 Phys. Plasmas 4 4419
[21] [22] Zou X, Liu J Y, Wang Z X, Gong Y, Liu Y, Wang X G 2004 Acta Phys. Sin. 53 3409 (in Chinese)[邹 秀、刘金远、王正汹、宫 野、刘 悦、王晓刚 2004 物理学报 53 3409]
[23] [24] [25] Liu J Y, Chen L, Wang F, Wang N, Duan P 2010 Acta Phys. Sin. 59 8692 (in Chinese)[刘金远、陈 龙、王 丰、王 楠、段 萍 2010 物理学报 59 8692]
[26] Wang Z X, Liu Y, Ren L W, Liu J Y, Wang X G 2006 Thin Solid Films 506 637
[27] [28] Duan P, Liu J Y, Gong Y, Liu Y, Wang X G 2007 Plasma Sci. Technol. 9 394
[29] [30] Yu D R, Qing S W, Wang X G, Ding Y J, Duan P 2011 Acta Phys. Sin. 60 025204(in Chinese)[于达仁、卿绍伟、王晓刚、丁永杰、段 萍 2011 物理学报 60 025204]
[31] [32] Xue Z H 2009 M. S. Dissertation (Dalian: Dalian University of Technology)(in Chinese)[薛忠华 2009 硕士学位论文 (大连: 大连理工大学)]
[33] [34] Lieberman M A, Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing (2nd ed) (New Jersey: John Wiley Sons) p31
[35] [36] [37] Chen F F 1974 Introduction to Plasma Physics (New York:Plenum) p156
[38] [39] Gascona N, Dudeck M, Barral S 2003 Phys. Plasmas 10 4123
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