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中国物理学会期刊
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Gao Hai-Bo, Li Rui, Lu Jing-Xiao, Wang Guo, Li Xin-Lin, Jiao Yue-Chao. High-rate deposition of microcrystalline silicon thin film by multi-step method. Acta Physica Sinica, 2012, 61(1): 018101. DOI: 10.7498/aps.61.018101
Citation: Gao Hai-Bo, Li Rui, Lu Jing-Xiao, Wang Guo, Li Xin-Lin, Jiao Yue-Chao. High-rate deposition of microcrystalline silicon thin film by multi-step method. Acta Physica Sinica, 2012, 61(1): 018101. DOI: 10.7498/aps.61.018101
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High-rate deposition of microcrystalline silicon thin film by multi-step method

Acta Phys. Sin., 2012, 61(1): 018101.
DOI: 10.7498/aps.61.018101
CSTR: 32037.14.aps.61.018101
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