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The propagation mechanisms of atmospheric pressure cold plasma jets have recently attracted much attention. In this paper, by using a self-consistent two-dimensional plasma fluid model, we have investigated the propagation problems in the cold atmospheric pressure helium plasma jets that are surrounded by helium itself and thin dielectric tube, respectively. The spatio-temporal distributions of electron density, ionization rate, electrical field, and electron temperature were obtained. It is found that both the radius and the permittivity of dielectric tube have an impact on the discharge characteristics. A new method of improving the electron density and plasma jet size was also proposed.
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Keywords:
- atmospheric pressure cold plasma jets /
- plasma bullet /
- numerical simulation /
- fluid model
[1] Park G, Park S, Choi M 2012 Plasma Sources Sci. Technol. 21 043001
[2] Li Q, Takana H, Pu Y 2012 Appl. Phys. Lett. 100 133501
[3] Lu X, Laroussi M, Puech V 2012 Plasma Sources Sci. Technol. 21 034005
[4] Laroussi M, Akan T 2007 Plasma Process. Polym 4 777
[5] Teschke M, Kedzierski J, Finantu-Dinu E 2005 IEEE Trans. Plasma Sci. 33 310
[6] Bourdet N, Laroussi M, Begum A 2009 J. Phys. D: Appl. Phys. 42 055207
[7] Beouf J, Yang L, Pitchford L 2013 J. Phys. D: Appl. Phys. 46 015201
[8] Breden D, Miki K, Raja L 2011 Appl. Phys. Lett. 99 111501
[9] Jansky J, Bourdon A 2011 Appl. Phys. Lett. 99 161504
[10] Naidis G 2011 Appl. Phys. Lett. 98 141501
[11] Dawson G, Winn W 1965 Z. Phys. 183 159
[12] Gallimberti I 1972 J. Phys. D: Appl. Phys. 5 2179
[13] Shao X, Jiang N, Zhang G, Cao Z 2012 Appl. Phys. Lett. 101 253509
[14] Xian Y, Lu X, Wu S 2012 Appl. Phys. Lett. 100 123702
[15] Zhu W, Li Q, Zhu X 2009 J. Phys. D: Appl. Phys. 42 202002
[16] Karakas E, Koklu M, Laroussi M 2010 J. Phys. D: Appl. Phys. 43 155202
[17] Xian Y, Lu X, Liu J 2012 Plasma Sources Sci. Technol. 21 034013
[18] Laroussi M, Akman M 2011 AIP Advances. 1 032138
[19] Hong Y, Cho S, Kim J 2007 Phys. Plasmas. 14 074502
[20] Bork W, Dijk J, Bowden M 2003 J. Phys. D: Appl. Phys.36 1967
[21] Jansky J, Bourdon A 2011 Appl. Phys. Lett. 99 161504
[22] Liu F, Zhang D, Wang D 2010 Phys. Plasmas. 17 103508
[23] Hagelaar G, Pitchford L 2005 Plasma Sources Sci. Technol. 14 722
[24] Wang Y, Wang D 2003 Acta Phys. Sin. 52 1694 (in Chinese) [王艳辉, 王德真 2003 物理学报 52 1694]
[25] Wang Y, Wang D 2005 Acta Phys. Sin. 54 1295 (in Chinese) [王艳辉, 王德真 2005 物理学报 54 1295]
[26] Zhang P, Kortshagen U 2006 J. Phys. D: Appl. Phys. 39 153-163.
[27] Jansky J, Tholin F, Bonaventura Z 2010 J. Phys. D: Appl. Phys. 43 395201
[28] Georghiou G, Papadakis A, Morrow R, Metaxas A 2005 J. Phys. D: Appl. Phys. 38 R303
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[1] Park G, Park S, Choi M 2012 Plasma Sources Sci. Technol. 21 043001
[2] Li Q, Takana H, Pu Y 2012 Appl. Phys. Lett. 100 133501
[3] Lu X, Laroussi M, Puech V 2012 Plasma Sources Sci. Technol. 21 034005
[4] Laroussi M, Akan T 2007 Plasma Process. Polym 4 777
[5] Teschke M, Kedzierski J, Finantu-Dinu E 2005 IEEE Trans. Plasma Sci. 33 310
[6] Bourdet N, Laroussi M, Begum A 2009 J. Phys. D: Appl. Phys. 42 055207
[7] Beouf J, Yang L, Pitchford L 2013 J. Phys. D: Appl. Phys. 46 015201
[8] Breden D, Miki K, Raja L 2011 Appl. Phys. Lett. 99 111501
[9] Jansky J, Bourdon A 2011 Appl. Phys. Lett. 99 161504
[10] Naidis G 2011 Appl. Phys. Lett. 98 141501
[11] Dawson G, Winn W 1965 Z. Phys. 183 159
[12] Gallimberti I 1972 J. Phys. D: Appl. Phys. 5 2179
[13] Shao X, Jiang N, Zhang G, Cao Z 2012 Appl. Phys. Lett. 101 253509
[14] Xian Y, Lu X, Wu S 2012 Appl. Phys. Lett. 100 123702
[15] Zhu W, Li Q, Zhu X 2009 J. Phys. D: Appl. Phys. 42 202002
[16] Karakas E, Koklu M, Laroussi M 2010 J. Phys. D: Appl. Phys. 43 155202
[17] Xian Y, Lu X, Liu J 2012 Plasma Sources Sci. Technol. 21 034013
[18] Laroussi M, Akman M 2011 AIP Advances. 1 032138
[19] Hong Y, Cho S, Kim J 2007 Phys. Plasmas. 14 074502
[20] Bork W, Dijk J, Bowden M 2003 J. Phys. D: Appl. Phys.36 1967
[21] Jansky J, Bourdon A 2011 Appl. Phys. Lett. 99 161504
[22] Liu F, Zhang D, Wang D 2010 Phys. Plasmas. 17 103508
[23] Hagelaar G, Pitchford L 2005 Plasma Sources Sci. Technol. 14 722
[24] Wang Y, Wang D 2003 Acta Phys. Sin. 52 1694 (in Chinese) [王艳辉, 王德真 2003 物理学报 52 1694]
[25] Wang Y, Wang D 2005 Acta Phys. Sin. 54 1295 (in Chinese) [王艳辉, 王德真 2005 物理学报 54 1295]
[26] Zhang P, Kortshagen U 2006 J. Phys. D: Appl. Phys. 39 153-163.
[27] Jansky J, Tholin F, Bonaventura Z 2010 J. Phys. D: Appl. Phys. 43 395201
[28] Georghiou G, Papadakis A, Morrow R, Metaxas A 2005 J. Phys. D: Appl. Phys. 38 R303
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