Time-resolved spectral characteristics of SF<sub>6</sub> plasma under femtosecond laser-guided high-voltage discharge

Zhang Yun-Gang; Liu Huang-Tao; Gao Qiang; Zhu Zhi-Feng; Li Bo; Wang Yong-Da

doi:10.7498/aps.69.20200636

Abstract

SF₆ is widely used in gas insulated switchgear due to its excellent insulating and arcing performance. SF₆ arc plasma has been extensively studied, but time-resolved spectral characteristics of SF₆ arc plasma have not been reported. In this paper, the optical filament generated from focused femtosecond laser is used to guide the high-voltage discharge for generating SF₆ plasma in SF₆ environment. The SF₆ plasma spectrum is obtained in a wavelength range of 300–820 nm, and the identification and attribution of the spectral lines are investigated. The S and F lines are mainly in the 300–550 nm band and 600–800 nm band, respectively. The analysis shows that the S and F atoms are mainly directly or indirectly generated by the collision between SF₆ and high-energy electrons during the SF₆ decomposition caused by discharge. The S ions are generated by the collision of S atoms with high-energy electrons. The time-resolved spectrum of the SF₆ plasma superimposed by the continuous spectrum and the line spectrum is given, and its intensity increases and then decreases. The continuous spectrum is mainly generated by the combined effect of bremsstrahlung and recombination radiation. The recombination radiation is mainly generated by the collision of electron with ions and the recombination between molecular and atoms after SF₆ decomposition. The fluorescence lifetime of S ion at 409.91 nm is 57 ns, and the fluorescence lifetime of F atom at 685.60 nm is 341 ns. The evolution law of electron temperature and density with time are given. The electron temperature reaches 2047 K in the early stage of plasma formation. After that, the electron temperature quickly falls to about 1600 K within 300 ns due to the rapid expansion of the plasma and the increase in energy loss during electron movement. At the beginning of discharge, a large number of electrons are generated due to the rapid decomposition of SF₆, and the electron density is highest ($ 10.1 \times {10^{17}}\;{\rm{c}}{{\rm{m}}^{ - {\rm{3}}}}$). After that, the electron density drops rapidly within 200 ns because the recombination between electrons and ions decreases with delay time. Finally, it is proved that the SF₆ plasma is in local thermal equilibrium based on the Mc Whirter criterion. The results are of great significance for studying the decomposition mechanism of SF₆ and the on-line monitoring technique of high-voltage equipment.

Keywords:

femtosecond laser-guided high-voltage discharge /
time-resolved spectroscopy /
electron temperature and density /
SF₆

Authors and contacts

1.
School of Electrical Engineering, Yanshan University, Qinhuangdao 066004, China
2.
State Key Laboratory of Engines, Tianjin University, Tianjin 300072, China

Corresponding author: Zhang Yun-Gang, zhangyg@ysu.edu.cn

Funds: Project supported by the National Natural Science Foundation of China (Grant Nos. 51806149, 61308065) and the Natural Science Foundation of Hebei Province, China (Grant No. E2015203014)

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References

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Cited By

图 1 实验装置示意图

Figure 1. Schematic diagram of experimental setup.

DownLoad: Full-Size Img PowerPoint

图 2 飞秒激光引导高压放电下的SF₆等离子体光谱图

Figure 2. SF₆ plasma spectrum under femtosecond laser-guided high-voltage discharge.

DownLoad: Full-Size Img PowerPoint

图 3 SF₆等离子体时间分辨光谱

Figure 3. SF₆ plasma time-resolved spectroscopy.

DownLoad: Full-Size Img PowerPoint

图 4 SF₆电弧等离子体时间衰减寿命曲线　(a) S III 409.91 nm; (b) F I 685.60 nm

Figure 4. Time decay life curves of SF₆ plasma: (a) S III 409.91 nm; (b) F I 685.60 nm.

DownLoad: Full-Size Img PowerPoint

图 5 延迟时间为3630 ns时的玻尔兹曼斜线

Figure 5. Boltzmann plot with a delay time of 3630 ns.

DownLoad: Full-Size Img PowerPoint

图 6 SF₆等离子体电子温度随时间的演化过程

Figure 6. Time-resolved electron temperature of SF₆ plasma.

DownLoad: Full-Size Img PowerPoint

图 7 SF₆等离子体电子密度随时间的演化过程

Figure 7. Time-resolved electron density of SF₆ plasma.

DownLoad: Full-Size Img PowerPoint

[1]	Cui Z, Zhang X X, Cheng Z, Li Y, Xiao H 2019 Spectroc. Acta Pt. A-Molec. Biomolec. Spectr. 215 187 Google Scholar
[2]	Zhong L P, Ji S C, Wang F, Sun Q Q, Chen S, Liu J, Hai B, Tang L 2019 J. Fluor. Chem. 220 61 Google Scholar
[3]	Tang J, Liu F, Zhang X X, Meng Q H, Zhou J B 2012 IEEE Trns. Dielectr. Electr. Insul. 19 29 Google Scholar
[4]	Tang J, Liu F, Meng Q H, Zhang X X, Tao J G 2012 IEEE Trns. Dielectr. Electr. Insul. 19 37 Google Scholar
[5]	Zeng F P, Tang J, Sun H J, Pan J Y, Yao Q, He J J, Hou X Z 2014 IEEE Trans. Dielectr. Electr. Insul. 21 1462 Google Scholar
[6]	Liu K, Ji S C, Zhong L P, Zhu L P 2016 International Conference on Condition Monitoring & Diagnosis Xi’an, China, Septenber 25–28, 2016, p578
[7]	Swarbrick, P 1967 Br. J. Appl. Phys. 18 419 Google Scholar
[8]	Gleizes A, Chervy B, Gonzalez J J 1999 J. Phys. D-Appl. Phys. 32 2060 Google Scholar
[9]	Girard R, Belhaouari J B, Gonzalez J J, Gleizes A 1999 J. Phys. D-Appl. Phys. 32 2890 Google Scholar
[10]	Rat V, André P, Aubreton J, Elchinger M F, Fauchais P, Lefort A 2001 J. Phys. D-Appl. Phys. 34 2191 Google Scholar
[11]	Coll I, Casanovas A M, Vial L, Gleizes A, Casanovas J 2000 J. Phys. D-Appl. Phys. 33 221 Google Scholar
[12]	Van Brunt R J, Herron J T 1990 IEEE Trans. Electr. Insul. 25 75 Google Scholar
[13]	Van Brunt R J, Herron J T 1994 Phys. Scr. 1994 9 Google Scholar
[14]	Gao Q Q, Niu C P, Wang X H, Yang A J, Wu Y, Murphy A B, Rong M Z, Fu X X, Liu J L, Xu Y B 2018 J. Phys. D-Appl. Phys. 51 295202 Google Scholar
[15]	Gao Q Q, Wang X H, Yang A J, Niu C P, Rong M Z, Jiao L L, Qing M 2019 Phys. Plasmas 26 033508 Google Scholar
[16]	Vacquie S, Gleizes A, Kafrouni H 1985 J. Phys. D-Appl. Phys. 18 2193 Google Scholar
[17]	徐建源, 王其平 1987 高压电器 1987 9 Xu J Y, Wang Q P 1987 High Voltage Apparatus 1987 9
[18]	林莘, 李鑫涛, 徐建源, 单长旺 2016 中国电机工程学报 36 301 Google Scholar Lin X, Li X T, Xu J Y, Shan C W 2016 Proc. Chin. Soc. Elect. Eng. 36 301 Google Scholar
[19]	李学斌, 黄旭, 赵义松, 单长旺, 庚振新, 李鑫涛, 林莘 2016 高压电器 52 55 Google Scholar Li X B, Huang X, Zhao Y S, Shan C W, Geng Z X, Li X T, Lin X 2016 High Voltage Apparatus 52 55 Google Scholar
[20]	庚振新, 石岩, 钟建英, 林莘, 苏镇西, 张友鹏, 徐建源 2017 高压电器 53 18 Google Scholar Geng Z X, Shi Y, Zhong J Y, Lin X, Su Z X, Zhang Y P, Xu J Y 2017 High Voltage Apparatus 53 18 Google Scholar
[21]	刘玉峰, 丁艳军, 彭志敏, 黄宇, 杜艳君 2014 物理学报 63 205205 Google Scholar Liu Y F, Ding Y J, Peng Z M, Huang Y, Du Y J 2014 Acta Phys. Sin. 63 205205 Google Scholar
[22]	Eschlböck-Fuchs S, Kolmhofer P J, Bodea M A, Hechenberger J G, Huber N, Rössler R, Pedarniga J D 2015 Spectroc. Acta Pt. B-Atom. Spectr. 109 31 Google Scholar
[23]	王飞鸣, 林莘, 徐建源 2014 高电压技术 40 3073 Google Scholar Wang F M, Lin X, Xu J Y 2014 High Voltage Engineering 40 3073 Google Scholar
[24]	刘家合, 鲁佳哲, 雷俊杰, 高勋, 林景全 2020 物理学报 69 057401 Google Scholar Liu J H, Lu J Z, Lei J J, Gao X, Lin J Q 2020 Acta Phys. Sin. 69 057401 Google Scholar
[25]	董丽芳, 冉俊霞, 毛志国 2005 物理学报 54 2167 Google Scholar Dong L F, Ran J X, Mao Z G 2005 Acta Phys. Sin. 54 2167 Google Scholar
[26]	Pagano, C, Hafeez, S, Lunney, J G 2009 J. Phys. D-Appl. Phys. 42 155205 Google Scholar

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Vol. 69, Issue 18 - 2020-09-20

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Time-resolved spectral characteristics of SF₆ plasma under femtosecond laser-guided high-voltage discharge

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Corresponding author: Zhang Yun-Gang, zhangyg@ysu.edu.cn

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Time-resolved spectral characteristics of SF6 plasma under femtosecond laser-guided high-voltage discharge

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Corresponding author: Zhang Yun-Gang, zhangyg@ysu.edu.cn

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References

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Time-resolved spectral characteristics of SF₆ plasma under femtosecond laser-guided high-voltage discharge