Discharge characteristics of argon brush plasma plume operated at atmospheric pressure

Yang Li-Jun; Song Cai-Hong; Zhao Na; Zhou Shuai; Wu Jia-Cun; Jia Peng-Ying

doi:10.7498/aps.70.20202091

Abstract

Atmospheric pressure non-equilibrium low-temperature plasma has been widely used in biomedicine, surface treatment and other fields, which has attracted the attention of researchers extensively. As one of the important methods to generate such a plasma, the plasma jet has become a popular method, which can generate a remote plasma plume at the nozzle through introducing a rare gas flow. However, plasma plume has a small diameter, which results in deficiency for the large-scale surface treatment. A dielectric barrier discharge device with three electrodes is utilized to produce a large brush-shaped plasma plume (50.0 mm × 40.0 mm) downstream of flowing argon under the combined excitation of an alternate current (AC) voltage and a negative bias voltage, thereby increasing the plume scale. The results show that the luminescence intensity of the plasma plume increases with AC peak voltage increasing. By fast photography implemented with an intensified charge coupled device (ICCD), it is found that the plasma plume is composed of temporally superposed branched-streamers. The ICCD images also reveal that the number of branches increases with AC peak voltage increasing. Moreover, the waveforms of AC voltage and light emission signal recorded simultaneously indicate that the plasma plume initiates once per AC voltage cycle, which occurs in the positive half cycle of the applied voltage. With AC peak voltage increasing, the duration and intensity of discharge pulse increase, which results from more branches of the branched streamer. Besides, optical emission spectrum in a range from 300 nm to 850 nm mainly includes OH (A²Σ⁺–X²Π) peaked at 308.0 nm, the second positive system of N₂ (C³Π_u–B³Π_g), Ar I (4p–4s), and O I (3p³ P–3s³ S) at 844.6 nm. Based on the optical emission spectrum, the plasma parameters such as vibrational temperature and intensity ratio of spectral lines (correlated with electron density and electron temperature) are investigated. Besides, the variation of concentration of oxygen atoms in the plasma plume with experimental parameters is investigated by optical actinometry. The results indicate that the concentration of oxygen atoms first increases and then decreases with the distance increasing along the argon flow direction or with oxygen content of the working gas increasing. In addition, the concentration of oxygen atoms increases with AC peak voltage increasing. All these results are discussed qualitatively. These results are of great importance in modifying the plasma surface on a large scale.

Keywords:

Authors and contacts

College of Physics Science and Technology, Hebei University, Baoding 071002, China

Corresponding author: Jia Peng-Ying, plasmalab@126.com

Funds: Project supported by the National Natural Science Foundation of China (Grant Nos. 11875121, 11575050, 51977057), the Natural Science Foundation of Hebei Province, China (Grant Nos. A2019201100, A2020201025), and the Postgraduate Innovation Fund Project of Hebei Province, China (Grant No. CXZZSS2020006)

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References

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Cited By

图 1 实验装置示意图

Figure 1. Schematic diagram of the experimental setup.

DownLoad: Full-Size Img PowerPoint

图 2 不同交流电压峰值及曝光时间下的等离子体羽照片

Figure 2. Images of the plasma plume with different peak voltage and exposure time.

DownLoad: Full-Size Img PowerPoint

图 3 外加电压、放电电流和刷形等离子体羽发光信号的波形　(a) 交流电压的幅值为8.0 kV; (b) 交流电压的幅值为10.5 kV

Figure 3. Waveforms of applied voltage, discharge current and integrated emission from the brush-shaped plasma plume: (a) The amplitude of alternating current of 8.0 kV; (b) the amplitude of alternating current of 10.5 kV.

DownLoad: Full-Size Img PowerPoint

图 4 不同V_p下的ICCD照片 (曝光时间为13.0 μs)　(a)−(c) 8.0 kV; (d)−(f) 10.5 kV

Figure 4. ICCD images with an exposure time of 13.0 μs for the plume at different V_p: (a)−(c) 8.0 kV; (d)−(f) 10.5 kV.

DownLoad: Full-Size Img PowerPoint

图 5 等离子体羽在300−850 nm的总发射光谱 (V_p = 8.0 kV)

Figure 5. 300−850 nm scanned spectrum emitted from the plasma plume (V_p = 8.0 kV).

DownLoad: Full-Size Img PowerPoint

图 6 谱线强度比和分子振动温度沿空间位置(a)、随氧气含量 (b) 和电压峰值 (c) 的变化

Figure 6. Intensity ratio of spectral lines and vibration temperature as a function of Y coordinate (a), oxygen concentration (b) and peak voltage (c).

DownLoad: Full-Size Img PowerPoint

图 7 844.6 nm与750.4 nm谱线的强度比沿Y轴(a)及随氧气含量(b)和电压峰值(c) 的变化规律

Figure 7. Intensity ratio of spectral lines (844.6 nm to 750.4 nm) as a function of Y coordinate (a), oxygen concentration (b) and peak voltage (c).

DownLoad: Full-Size Img PowerPoint

[1]	Liao X Y, Li J, Muhammad A I, et al. 2018 Food Control 90 241 Google Scholar
[2]	Keidar M, Shashurin A, Volotskova O, Stepp M A, Srinivasan P, Sandler A, Trink B 2013 Phys. Plasmas 20 057101 Google Scholar
[3]	Athanasopoulus D, Svarnas P, Ladas S, Kennou S, Koutsoukos P 2018 Appl. Phys. Lett. 112 213703 Google Scholar
[4]	Daeschlein G, Woedtke T V, Kindel E, et al. 2010 Plasma Processes Polym. 7 224 Google Scholar
[5]	Li X C, Liu R J, Li X N, Gao K, Wu J C, Gong D D, Jia P Y 2019 Phys. Plasmas 26 023510 Google Scholar
[6]	Jung H, Kim W H, Oh I K, et al. 2016 J. Mater. Sci. 51 5082 Google Scholar
[7]	Ning W J, Dai D, Zhang Y H 2019 Appl. Phys. Lett. 114 054104 Google Scholar
[8]	Li X, Yang D Z, Yuan H, Zhao Z L, Zhou X F, Zhang L, Wang W C 2019 High Volt. 4 228 Google Scholar
[9]	Massines F, Gherardi N, Naudé N, Ségur P 2005 Plasma Phys. Controlled Fusion 47 B577 Google Scholar
[10]	Luo H Y, Liang Z, Lv B, Wang X X, Guan Z C 2007 Appl. Phys. Lett. 91 221504 Google Scholar
[11]	Wang X X, Li C R, Lu M Z, Pu Y K 2003 Plasma Sources Sci. Technol. 12 358 Google Scholar
[12]	Fang Z, Lin J, Xie X, Qiu Y, Kuffel E 2009 J. Phys. D: Appl. Phys. 42 085203 Google Scholar
[13]	Lu X P, Laroussi M 2006 J. Appl. Phys. 100 063302 Google Scholar
[14]	Teschke M, Kedzierski J, Finantu-Dinu E G, Korzec D, Engemann J 2005 IEEE Trans. Plasma Sci. 33 310 Google Scholar
[15]	Kim D B, Rhee J K, Gweon B, Moon S Y, Choe W 2007 Appl. Phys. Lett. 91 151502 Google Scholar
[16]	Sands B L, Ganguly B N, Tachibana K 2008 Appl. Phys. Lett. 92 151503 Google Scholar
[17]	Zhu W D, Lopez J L 2012 Plasma Sources Sci. Technol. 21 034018 Google Scholar
[18]	Walsh J L, Kong M G 2008 Appl. Phys. Lett. 93 111501 Google Scholar
[19]	Ghasemi M, Olszewski P, Bradley J W, Walsh J L 2013 J. Phys. D: Appl. Phys. 46 052001 Google Scholar
[20]	Cao Z, Walsh J L, Kong M G 2009 Appl. Phys. Lett. 94 021501 Google Scholar
[21]	Tang J, Cao W Q, Zhao W, Wang Y S, Duan Y X 2012 Phys. Plasmas 19 031501 Google Scholar
[22]	Li X C, Chu J D, Jia P Y, Li Y R, Wang B, Dong L F 2018 IEEE Trans. Plasma Sci. 46 582 Google Scholar
[23]	Li X C, Chu J D, Zhang Q, Zhang P P, Jia P Y, Geng J L 2016 Appl. Phys. Lett. 109 204102 Google Scholar
[24]	Liu X, Wang C C, Liu J Y, Wang C S, Yang Z K, Chen F Z, Song J L 2019 J. Appl. Phys. 125 123301 Google Scholar
[25]	Li Q, Takana H, Pu Y K, Nishiyama H 2011 Appl. Phys. Lett. 98 241501 Google Scholar
[26]	Li Q, Takana H, Pu Y K, Nishiyama H 2012 Appl. Phys. Lett. 100 133501 Google Scholar
[27]	Li X C, Lin X T, Wu K Y, Ren C H, Liu R, Jia P Y 2019 Plasma Sources Sci. Technol. 28 055006 Google Scholar
[28]	Jiang N, Ji A L, Cao Z X 2009 J. Appl. Phys. 106 013308 Google Scholar
[29]	Kovach Y E, Garcia M C, Foster J E 2019 IEEE Trans. Plasma Sci. 47 3214 Google Scholar
[30]	李寿哲 2019 低温等离子体光谱理论基础及应用 (第1版) (大连: 大连理工大学出版社) 第185页 Li S Z 2019 Fundamentals of Low-temperature Plasma Spectroscopy and its Application (1st Ed.) (Dalian: Dalian University of Technology Press) p185 (in Chinese)
[31]	Thiyagarajan M, Sarani A, Nicula C 2013 J. Appl. Phys. 113 233302 Google Scholar
[32]	Zhang B, Zhu Y, Liu F, Fang Z 2017 Plasma Sci. Technol. 19 064011 Google Scholar
[33]	Teodorescu M, Bazavan M, Ionita E R, Dinescu G 2015 Plasma Sources Sci. Technol. 24 025033 Google Scholar
[34]	Wu K Y, Wu J C, Jia B Y, Ren C H, Kang P C, Jia P Y, Li X C 2020 Phys. Plasmas 27 082308 Google Scholar
[35]	Li X C, Chen J Y, Lin X T, Wu J C, Wu K Y, Jia P Y 2020 Plasma Sources Sci. Technol. 29 065015 Google Scholar
[36]	Xiao D Z, Cheng C, Shen J, Lan Y, Xie H B, Shu X S, Meng Y D, Li J G 2014 Phys. Plasmas 21 053510 Google Scholar
[37]	Lieberman M A, Lichtenberg A J 1994 Principles of Plasma Discharges and Materials Processing (New York: Wiley) p550
[38]	Shao X J, Chang Z S, Mu H B, Liao W L, Zhang G J 2013 IEEE Trans. Plasma Sci. 41 899 Google Scholar
[39]	Lowke J J 1992 J. Phys. D: Appl. Phys. 25 202 Google Scholar

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