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Giant coercivity in single crystal Ta3FeS6 film

Liu Xiao-Wei Xiong Jun-Lin Wang Li-Zheng Liang Shi-Jun Cheng Bin Miao Feng

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Giant coercivity in single crystal Ta3FeS6 film

Liu Xiao-Wei, Xiong Jun-Lin, Wang Li-Zheng, Liang Shi-Jun, Cheng Bin, Miao Feng
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  • Van der Waals (vdW) layered ferromagnetic materials provide a unique platform for fundamental spintronic research, and have broad application prospects in the next-generation spintronic devices. In this study, we synthesize high-quality single crystals of vdW intrinsic ferromagnet Ta3FeS6 by the chemical vapor transport method. We obtain thin layer samples of Ta3FeS6 with thickness values ranging from 19 to 100 nm by the mechanical exfoliation method, and find that their corresponding Curie temperatures are between 176 and 133 K. The anomalous Hall measurement shows that the Ta3FeS6 has out-of-plane ferromagnetism with the coercivity reaching 7.6 T at 1.5 K, which is the largest value in those of the layered vdW ferromagnetic materials reported so far. In addition, we observe that the reversal polarity of the hysteresis loop changes sign with temperature increasing. Our work provides an opportunity to construct stable and miniaturized spintronic devices and present a new platform for studying spintronics based on van der Waals magnetic materials.
      Corresponding author: Cheng Bin, bincheng@njust.edu.cn ; Miao Feng, miao@nju.edu.cn
    • Funds: Project supported by the National Natural Science Foundation of China (Grant Nos. 12074176, 62122036, 62034004, 61921005, 61974176), the Strategic Priority Research Program of the Chinese Academy of Sciences (Grant No. XDB44000000), and the Fundamental Research Funds for the Central Universities of Ministry of Education of China (Grant No. 020414380179).
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  • 图 1  (a) Ta3FeS6的晶体结构. 左侧为1层Ta3FeS6的原子结构俯视图, 右侧为Ta3FeS6晶体的三维结构示意图, 其中铁原子嵌在H-TaS2的层间; (b) Ta3FeS6单晶的能量色散X射线光谱, 插图为通过CVT方法生长的Ta3FeS6单晶的光学照片; (c) Ta3FeS6单晶的拉曼光谱; (d)原子力显微镜对Ta3FeS6器件1的样品厚度测量结果

    Figure 1.  (a) Crystal structure of Ta3FeS6. The left panel is the top view of the atomic structure of single layer of Ta3FeS6, and the right panel is the three-dimensional structure diagram of Ta3FeS6 crystal, in which iron atoms are embedded between the layers of H-TaS2. (b) Energy dispersive X-ray spectrum of Ta3FeS6 single crystal. The inset is the optical photo of Ta3FeS6 single crystal grown by chemical vapor transport method. (c) Raman spectrum of Ta3FeS6. (d) Measurement result of sample thickness of Ta3FeS6 device 1 by atomic force microscope.

    图 2  (a) 器件结构和外部测量电路的示意图; (b) 器件1的纵向电阻Rxx的降温曲线. 插图为器件1的光学照片; (c) 器件2的纵向电阻Rxx的降温曲线. 插图为器件2 的光学照片

    Figure 2.  (a) Diagram of the device and external circuit. The cooling curve of longitudinal resistance Rxx of the device 1 (b) and device 2 (c). The inset is the optical photograph of the device 1 (b) and device 2 (c).

    图 3  (a) 器件1温度依赖的磁阻和反常霍尔电阻. 红线代表正向扫描, 蓝线代表反向扫描; (b) 器件1和器件2矫顽场随温度的变化关系. 插图为器件1和器件2温度依赖的矫顽场在高温区的局部放大图; (c) 器件1载流子浓度随温度的变化关系; (d) 已报道的二维铁磁材料(VSe2[56], VI3[57], Fe3GeTe2 单层[17], Fe3GeTe2 12 nm[18], Fe2Co0.7GeTe2[58], Cr2Ge2Te6 7 nm[59], Cr3Cl2(pyrazine)2[60], Ta3FeS6 纳米片[29], Fe0.28TaS2 80—180 nm[55])不同温度下矫顽场的统计结果

    Figure 3.  (a) Temperature dependent magneto-resistance and anomalous Hall resistance of device 1. The red line represents forward scanning and the blue line represents reverse scanning. (b) The relationship between coercivity and temperature for device 1 and device 2. The inset shows a local enlarged view of the temperature-dependent coercive fields of device 1 and device 2 in the high temperature zone. (c) The carrier concentration as a function of temperature in device 1. (d) The statistical results of coercivity of the reported two-dimensional ferromagnetic materials (VSe2[56], VI3[57], Fe3GeTe2 monolayer[17], Fe3GeTe2 12 nm[18], Fe2Co0.7GeTe2[58], Cr2Ge2Te6 7 nm[59], Cr3Cl2(pyrazine)2[60], Ta3FeS6 nanosheet[29], Fe0.28TaS2 80–180 nm[55]) at different temperatures.

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Metrics
  • Abstract views:  3155
  • PDF Downloads:  168
  • Cited By: 0
Publishing process
  • Received Date:  15 April 2022
  • Accepted Date:  28 April 2022
  • Available Online:  23 June 2022
  • Published Online:  20 June 2022

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