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Multi-spectral compatible stealth materials have become an imperative development trend, especially visible and infrared compatible stealth materials have become the most important in the field of optoelectronic stealth technology. However, infrared stealth and visible stealth have different requirements for spectral response, which makes it difficult to reconcile the design of functional coupling materials. Therefore, it is very important to develop selective control technology of optical characteristics. A visible and infrared compatible stealth superstructure thin film is proposed based on the FTO/Ag/FTO stacked film structure. A collaborative design method for high visible transmission and low infrared radiation is established, and the mechanism of microstructure characteristics affecting visible transmission and infrared reflection spectra is explained. The infrared stealth thin film with high transparency is optimized, and its compatibility stealth performance is tested and characterized by visible light transmission spectrum, infrared reflection spectrum, and thermal imaging characterization technology. It is shown that visible transmission depends on the coupling and matching effect between the semiconductor dielectric layer and the metal layer, while infrared radiation suppression mainly relies on the metal layer. As the thickness of FTO film increases, the visible transmission peak undergoes a red shift, leading the transmission spectrum curve to flatten, the average transmission first increases and then gradually decreases. As the thickness of Ag thin film layer increases, the transmission peak of visible light undergoes a blue shift, causing the transmission spectrum curve to tend to a high-frequency transmission state, narrowing the frequency domain of visible light transmission and gradually reducing the average transmittance decreases gradually. At the same time, the infrared reflectance increases with the Ag film thickness increasing, but the change of amplitude significantly decreasing when the Ag film thickness is greater than 18 nm. When the thickness of the optimized FTO/Ag/FTO film structure is 40/12/40 nm, it has a high level of background perspective reproduction and high ability to suppress high-temperature infrared radiation. The average transmittance of 0.38–0.78 μm visible light band is 82.52%, and the average reflectance of 3–14 μm mid-far infrared band is 81.46%. The radiation temperature of the sample is 49 ℃ lower in the mid infrared range and 75.8 ℃ lower in far infrared range than that of the quartz sheet at 150 ℃, respectively. The new stealth film can be attached to the camouflage coating surface of special vehicle to achieve visible and infrared compatible stealth, and can be used for cockpit windows to ensure thermal insulation, temperature control, and infrared stealth without affecting the field of view. This study can provide a new approach for designing and utilizing the visible and infrared compatible stealth materials.
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Keywords:
- multispectral compatible stealth /
- high transparency /
- infrared low radiation /
- material design
[1] 王浩, 姚能智, 王斌, 王学生 2022 物理学报 71 134703Google Scholar
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Liu K 2016 M. S. Thesis (Nanjing: Nanjing University of Aeronautics and Astronautics
[7] 韩超 2015 硕士学位论文 (杭州: 浙江理工大学)
Han C 2015 M. S. Thesis (Hangzhou: Zhejiang Sci-Tech University
[8] 王自荣, 余大斌, 孙晓泉 2000 上海航天 17 24Google Scholar
Wang Z R, Yu D B, Sun X Q 2000 Aerospace Shanghai 17 24Google Scholar
[9] 冯奎胜, 李娜, 李桐 2022 物理学报 71 034101Google Scholar
Feng K S, Li N, Li T 2022 Acta Phys. Sin. 71 034101Google Scholar
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[11] Shim H B, Han K, Song J, Hahn J W 2022 Adv. Opt. Mater. 6 10Google Scholar
[12] 陈天航, 郑斌, 钱超, 陈红胜 2020 物理学报 69 154104Google Scholar
Chen T H, Zheng B, Qian C, Chen H S 2020 Acta Phys. Sin. 69 154104Google Scholar
[13] Zhao Y C, Fang F 2021 ACS Appl. Electron. Mater. 3 2694Google Scholar
[14] Qi D, Chen F, Wang X, Luo H, Cheng Y Z, Niu X Y, Gong R Z 2018 Opt. Lett. 43 5323Google Scholar
[15] Xiong Y, Chen F, Cheng Y Z, Luo H 2022 J. Alloy Compd. 920 166008Google Scholar
[16] Xiong Y, Chen F, Cheng Y Z, Luo H 2022 Opt. Mater. 132 112745Google Scholar
[17] 黎思睿, 李佳, 刘科, 黄奕嘉, 李玲, 周晓林 2021 四川大学学报 6 115Google Scholar
Li S R, Li J, Liu K, Huang Y J, Li L, Zhou X L 2021 J. Sichuan Univ. 6 115Google Scholar
[18] 牛帅, 杨昌, 常慧聪, 肖林, 郭楠, 曲彦臣, 李国华 2022 红外与毫米波学报 41 745Google Scholar
Niu S, Yang C, Chang H C, Xiao L, Guo N, Qu Y C, Li G H 2022 J. Infrared Millim. W. 41 745Google Scholar
[19] 朱桓正 2021 博士学位论文 (杭州: 浙江大学)
Zhu H Z 2021 Ph. D. Dissertation (Hangzhou: Zhejiang University
[20] Leftheriotis G, Yianoulis P, Patrikios D 1997 Thin Solid Films 306 92Google Scholar
[21] Leng J, Yu Z N, Xue W, Zhang T, Jiang Y R, Zhang J, Zhang D P 2010 J. Appl. Phys. 108 073109Google Scholar
[22] Wu C C, Chen P S, Peng C H, Wang C C 2013 J. Mater. Sci-Mater. El. 24 2461Google Scholar
[23] Daeil K 2010 Appl. Surf. Sci. 257 704Google Scholar
[24] Liu X J, Cai X, Qiao J S, Mao J F, Jiang N 2003 Thin Solid Films 441 200Google Scholar
[25] Wang L, Wang W H, Wang L Y, Liu G, Ge C Q, Yang N J, Li P 2022 J. Opt. 51 874Google Scholar
[26] 王子君 2018 博士学位论文 (合肥: 中国科学技术大学)
Wang Z J 2018 Ph. D. Dissertation (Hefei: University of Science and Technology of China
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[1] 王浩, 姚能智, 王斌, 王学生 2022 物理学报 71 134703Google Scholar
Wang H, Yao Ne Z, Wang B, Wang X S 2022 Acta Phys. Sin. 71 134703Google Scholar
[2] Zhu R C, Wang J F, Xu C L, Feng M D, Sui S, Wang J, Qiu T S, Zhang L, Jia Y X, Zhang Z T, Qu S B 2020 Infrared Phys. Techn. 111 103546Google Scholar
[3] Huang S N, Fan Q, Xu C L, Wang B K, Wang J F, Yang B Y, Tian C H, Meng Z 2020 Infrared Phys. Techn. 111 103524Google Scholar
[4] Zhong S M, Wu L J, Liu T J, Huang J F, Jiang W, Ma, Y G 2018 Opt. Express 26 16466Google Scholar
[5] Ren Z Y, Chen L P, Liu X M, Li G J, Wang K, Wang Q 2020 Infrared Phys. Techn. 111 103472Google Scholar
[6] 刘凯 2016 硕士学位论文 (南京: 南京航空航天大学)
Liu K 2016 M. S. Thesis (Nanjing: Nanjing University of Aeronautics and Astronautics
[7] 韩超 2015 硕士学位论文 (杭州: 浙江理工大学)
Han C 2015 M. S. Thesis (Hangzhou: Zhejiang Sci-Tech University
[8] 王自荣, 余大斌, 孙晓泉 2000 上海航天 17 24Google Scholar
Wang Z R, Yu D B, Sun X Q 2000 Aerospace Shanghai 17 24Google Scholar
[9] 冯奎胜, 李娜, 李桐 2022 物理学报 71 034101Google Scholar
Feng K S, Li N, Li T 2022 Acta Phys. Sin. 71 034101Google Scholar
[10] Liu B, Chen Z S, Li Z G, Shi J M, Wang H 2020 Opt. Eng. 59 127107Google Scholar
[11] Shim H B, Han K, Song J, Hahn J W 2022 Adv. Opt. Mater. 6 10Google Scholar
[12] 陈天航, 郑斌, 钱超, 陈红胜 2020 物理学报 69 154104Google Scholar
Chen T H, Zheng B, Qian C, Chen H S 2020 Acta Phys. Sin. 69 154104Google Scholar
[13] Zhao Y C, Fang F 2021 ACS Appl. Electron. Mater. 3 2694Google Scholar
[14] Qi D, Chen F, Wang X, Luo H, Cheng Y Z, Niu X Y, Gong R Z 2018 Opt. Lett. 43 5323Google Scholar
[15] Xiong Y, Chen F, Cheng Y Z, Luo H 2022 J. Alloy Compd. 920 166008Google Scholar
[16] Xiong Y, Chen F, Cheng Y Z, Luo H 2022 Opt. Mater. 132 112745Google Scholar
[17] 黎思睿, 李佳, 刘科, 黄奕嘉, 李玲, 周晓林 2021 四川大学学报 6 115Google Scholar
Li S R, Li J, Liu K, Huang Y J, Li L, Zhou X L 2021 J. Sichuan Univ. 6 115Google Scholar
[18] 牛帅, 杨昌, 常慧聪, 肖林, 郭楠, 曲彦臣, 李国华 2022 红外与毫米波学报 41 745Google Scholar
Niu S, Yang C, Chang H C, Xiao L, Guo N, Qu Y C, Li G H 2022 J. Infrared Millim. W. 41 745Google Scholar
[19] 朱桓正 2021 博士学位论文 (杭州: 浙江大学)
Zhu H Z 2021 Ph. D. Dissertation (Hangzhou: Zhejiang University
[20] Leftheriotis G, Yianoulis P, Patrikios D 1997 Thin Solid Films 306 92Google Scholar
[21] Leng J, Yu Z N, Xue W, Zhang T, Jiang Y R, Zhang J, Zhang D P 2010 J. Appl. Phys. 108 073109Google Scholar
[22] Wu C C, Chen P S, Peng C H, Wang C C 2013 J. Mater. Sci-Mater. El. 24 2461Google Scholar
[23] Daeil K 2010 Appl. Surf. Sci. 257 704Google Scholar
[24] Liu X J, Cai X, Qiao J S, Mao J F, Jiang N 2003 Thin Solid Films 441 200Google Scholar
[25] Wang L, Wang W H, Wang L Y, Liu G, Ge C Q, Yang N J, Li P 2022 J. Opt. 51 874Google Scholar
[26] 王子君 2018 博士学位论文 (合肥: 中国科学技术大学)
Wang Z J 2018 Ph. D. Dissertation (Hefei: University of Science and Technology of China
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