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The enhancement mechanism of the optimized CVL by a genetic algorithm are presented in this paper. With a small storage capacitance and a small peaking capacitance, the input power increases due to the improved impedance matching between the laser head and the discharging LC circuit by the optimization. The lasing population increases as a result of the increased tube-wall temperature. The plasma electron temperature increases more rapidly during the period of the discharge, and the electron density increases obviously after the optimization.
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Keywords:
- copper vapor laser /
- enhanced kinetics /
- optimization mechanisms
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