-
Basing on vector electromagnetic theory and the waveguide model, the vectorial Hopkins formula is deduced. It containes incidence angle and azimuth angle of off-axis illumination, which is different from the traditional scalar Hopkins formula. By simulating the aerial image of the three dimensional mask in actual lithography process, the optimal angular range of oblique incidence is analyzed, and the impact of oblique incidence angle on imaging quality is also discussed.
-
Keywords:
- optical lithography /
- vectorial Hopkins formula /
- vector electromagnetism theory /
- off-axis illumination
Catalog
Metrics
- Abstract views: 8251
- PDF Downloads: 937
- Cited By: 0