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Radial density uniformity of dual frequency capacitively coupled plasma

Jiang Xiang-Zhan Liu Yong-Xin Bi Zhen-Hua Lu Wen-Qi Wang You-Nian

Radial density uniformity of dual frequency capacitively coupled plasma

Jiang Xiang-Zhan, Liu Yong-Xin, Bi Zhen-Hua, Lu Wen-Qi, Wang You-Nian
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  • Received Date:  14 December 2010
  • Accepted Date:  04 February 2011
  • Published Online:  05 January 2012

Radial density uniformity of dual frequency capacitively coupled plasma

  • 1. School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China;
  • 2. Xinjiang Ploytechnical College, Urumqi 830091, China
Fund Project:  Project supported by the Key Program of the National Natural Science Foundation of China (Grant No. 10635010).

Abstract: The influences on dual frequency capacitively coupled plasma radial uniformity are studied with a newly developed complete floating double probe. It is found that low frequency power, discharge pressure and gap have significant effects on radial uniformity. The results show that a suitable low frequency power, discharge pressure and larger discharge gap can achieve more uniform plasma. Finally, the improved two-dimensional fluid model simulations are performed with the same discharge parameters in experiment. The radial ion density distributions are obtained for different discharge gaps. The results are almost consistent with each other.

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