THE INFLUENCE OF THE JUNCTION RESISTANCE ON THE COUPLING BETWEEN THE MICROWAVE AND THE JOSEPHSON TUNNELING JUNCTION

LIU FU-SUI; WU HANG-SHENG

doi:10.7498/aps.27.353

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LIU FU-SUI, WU HANG-SHENG. THE INFLUENCE OF THE JUNCTION RESISTANCE ON THE COUPLING BETWEEN THE MICROWAVE AND THE JOSEPHSON TUNNELING JUNCTIONJ. Acta Physica Sinica, 1978, 27(3): 353-355. DOI: 10.7498/aps.27.353

Citation:

LIU FU-SUI, WU HANG-SHENG. THE INFLUENCE OF THE JUNCTION RESISTANCE ON THE COUPLING BETWEEN THE MICROWAVE AND THE JOSEPHSON TUNNELING JUNCTIONJ. Acta Physica Sinica, 1978, 27(3): 353-355. DOI: 10.7498/aps.27.353

Citation:

LIU FU-SUI, WU HANG-SHENG. THE INFLUENCE OF THE JUNCTION RESISTANCE ON THE COUPLING BETWEEN THE MICROWAVE AND THE JOSEPHSON TUNNELING JUNCTIONJ. Acta Physica Sinica, 1978, 27(3): 353-355. DOI: 10.7498/aps.27.353