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中国物理学会期刊
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SHI YI-SHENG, ZHAO TE-XIU, LIU HONG-TU, WANG XIAO-PING. A STUDY ON ELECTRICAL RESISTIVITY OF RF SPUTTERING Pd FILMSJ. Acta Physica Sinica, 1990, 39(11): 1803-1810. DOI: 10.7498/aps.39.1803
Citation: SHI YI-SHENG, ZHAO TE-XIU, LIU HONG-TU, WANG XIAO-PING. A STUDY ON ELECTRICAL RESISTIVITY OF RF SPUTTERING Pd FILMSJ. Acta Physica Sinica, 1990, 39(11): 1803-1810. DOI: 10.7498/aps.39.1803
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A STUDY ON ELECTRICAL RESISTIVITY OF RF SPUTTERING Pd FILMS

Acta Phys. Sin., 1990, 39(11): 1803-1810.
DOI: 10.7498/aps.39.1803
CSTR: 32037.14.aps.39.1803
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