1990, 39(11): 1697-1704.
DOI: 10.7498/aps.39.1697
CSTR: 32037.14.aps.39.1697
1990, 39(11): 1705-1713.
DOI: 10.7498/aps.39.1705
CSTR: 32037.14.aps.39.1705
1990, 39(11): 1714-1720.
DOI: 10.7498/aps.39.1714
CSTR: 32037.14.aps.39.1714
1990, 39(11): 1721-1729.
DOI: 10.7498/aps.39.1721
CSTR: 32037.14.aps.39.1721
1990, 39(11): 1745-1750.
DOI: 10.7498/aps.39.1745
CSTR: 32037.14.aps.39.1745
1990, 39(11): 1751-1757.
DOI: 10.7498/aps.39.1751
CSTR: 32037.14.aps.39.1751
1990, 39(11): 1758-1763.
DOI: 10.7498/aps.39.1758
CSTR: 32037.14.aps.39.1758
1990, 39(11): 1764-1771.
DOI: 10.7498/aps.39.1764
CSTR: 32037.14.aps.39.1764
1990, 39(11): 1772-1777.
DOI: 10.7498/aps.39.1772
CSTR: 32037.14.aps.39.1772
1990, 39(11): 1778-1784.
DOI: 10.7498/aps.39.1778
CSTR: 32037.14.aps.39.1778
1990, 39(11): 1785-1790.
DOI: 10.7498/aps.39.1785
CSTR: 32037.14.aps.39.1785
1990, 39(11): 1791-1795.
DOI: 10.7498/aps.39.1791
CSTR: 32037.14.aps.39.1791
STUDIES AND ANALYSIS FOR MICROSTRUCTURES OF MICRO-CRYSTALLIZATION PROCESS OF AMORPHOUS SILICON FILMS
1990, 39(11): 1796-1802.
DOI: 10.7498/aps.39.1796
CSTR: 32037.14.aps.39.1796
1990, 39(11): 1803-1810.
DOI: 10.7498/aps.39.1803
CSTR: 32037.14.aps.39.1803
1990, 39(11): 1811-1814.
DOI: 10.7498/aps.39.1811
CSTR: 32037.14.aps.39.1811
1990, 39(11): 1815-1819.
DOI: 10.7498/aps.39.1815
CSTR: 32037.14.aps.39.1815
1990, 39(11): 1820-1825.
DOI: 10.7498/aps.39.1820
CSTR: 32037.14.aps.39.1820
1990, 39(11): 1835-1841.
DOI: 10.7498/aps.39.1835
CSTR: 32037.14.aps.39.1835
1990, 39(11): 1842-1847.
DOI: 10.7498/aps.39.1842
CSTR: 32037.14.aps.39.1842
1990, 39(11): 1848-1853.
DOI: 10.7498/aps.39.1848
CSTR: 32037.14.aps.39.1848
1990, 39(11): 1854-1862.
DOI: 10.7498/aps.39.1854
CSTR: 32037.14.aps.39.1854


