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中国物理学会期刊
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YE CHAO, NING ZHAO-YUAN, CHENG SHAN-HUA, KANG JIAN. STUDY ON α-C∶F FILMS DEPOSITED BY ELECTRON CYCLOTRONRESONANCE PLASMA CHEMICAL VAPOR DEPOSITIONJ. Acta Physica Sinica, 2001, 50(4): 784-789. DOI: 10.7498/aps.50.784
Citation: YE CHAO, NING ZHAO-YUAN, CHENG SHAN-HUA, KANG JIAN. STUDY ON α-C∶F FILMS DEPOSITED BY ELECTRON CYCLOTRONRESONANCE PLASMA CHEMICAL VAPOR DEPOSITIONJ. Acta Physica Sinica, 2001, 50(4): 784-789. DOI: 10.7498/aps.50.784
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STUDY ON α-C∶F FILMS DEPOSITED BY ELECTRON CYCLOTRONRESONANCE PLASMA CHEMICAL VAPOR DEPOSITION

Acta Phys. Sin., 2001, 50(4): 784-789.
DOI: 10.7498/aps.50.784
CSTR: 32037.14.aps.50.784
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