Cathode etching phenomenon of high beam-anode ion source and its elimination measures

Tang Shi-Yi; Ma Zi-Qi; Zou Yun-Xiao; An Xiao-Kai; Yang Dong-Jie; Liu Liang-Liang; Cui Sui-Han; Wu Zhong-Zhen

doi:10.7498/aps.73.20240494

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Tang Shi-Yi, Ma Zi-Qi, Zou Yun-Xiao, An Xiao-Kai, Yang Dong-Jie, Liu Liang-Liang, Cui Sui-Han, Wu Zhong-Zhen. Cathode etching phenomenon of high beam-anode ion source and its elimination measuresJ. Acta Physica Sinica, 2024, 73(18): 185202. DOI: 10.7498/aps.73.20240494

Citation:

Tang Shi-Yi, Ma Zi-Qi, Zou Yun-Xiao, An Xiao-Kai, Yang Dong-Jie, Liu Liang-Liang, Cui Sui-Han, Wu Zhong-Zhen. Cathode etching phenomenon of high beam-anode ion source and its elimination measuresJ. Acta Physica Sinica, 2024, 73(18): 185202. DOI: 10.7498/aps.73.20240494

Citation:

Tang Shi-Yi, Ma Zi-Qi, Zou Yun-Xiao, An Xiao-Kai, Yang Dong-Jie, Liu Liang-Liang, Cui Sui-Han, Wu Zhong-Zhen. Cathode etching phenomenon of high beam-anode ion source and its elimination measuresJ. Acta Physica Sinica, 2024, 73(18): 185202. DOI: 10.7498/aps.73.20240494