High-resolution resonant inelastic X-ray scattering study of W-L<sub>3</sub> edge in WSi<sub>2</sub>

ZHAO Zheqian; WANG Shuxing; WANG Xiyuan; SU Yang; MA Ziru; HUANG Xinchao; ZHU Linfan

doi:10.7498/aps.74.20250659

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ZHAO Zheqian, WANG Shuxing, WANG Xiyuan, SU Yang, MA Ziru, HUANG Xinchao, ZHU Linfan. High-resolution resonant inelastic X-ray scattering study of W-L3 edge in WSi2J. Acta Physica Sinica, 2025, 74(18): 183201. DOI: 10.7498/aps.74.20250659

Citation:

ZHAO Zheqian, WANG Shuxing, WANG Xiyuan, SU Yang, MA Ziru, HUANG Xinchao, ZHU Linfan. High-resolution resonant inelastic X-ray scattering study of W-L3 edge in WSi2J. Acta Physica Sinica, 2025, 74(18): 183201. DOI: 10.7498/aps.74.20250659

Citation:

ZHAO Zheqian, WANG Shuxing, WANG Xiyuan, SU Yang, MA Ziru, HUANG Xinchao, ZHU Linfan. High-resolution resonant inelastic X-ray scattering study of W-L3 edge in WSi2J. Acta Physica Sinica, 2025, 74(18): 183201. DOI: 10.7498/aps.74.20250659