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The self-organized striation phenomenon in the positive column region of glow discharge plasma is a basic problem in gas discharge physics, which involves rich physics such as electron dynamics, transport process, discharge instability and nonlinear phenomenon. It is an important topic in basic physics and practical application. In this work an argon glow discharge striation plasma at high pressure is reported. The electrical, optical and ionization wave propagation characteristics of the striation plasma, and the evolution of the striation plasma with pressure and impurity gas are investigated experimentally. The generation and quenching mechanism of argon striation plasma are analyzed. The results show that the striation length is about 1.5 mm, and decreases with pressure increasing, and the velocity and frequency of the ionization wave are estimated at 1.87 m/s and 1.25 kHz, respectively. The measurement of optical emission spectrum shows that the generation of striation plasma is probably related to the argon metastable atoms. The stepwise ionization process caused by metastable atoms triggers off an ionization instability. The instability propagates in the form of ionization wave, which leads the plasma parameters to be modulated longitudinally, thus, forming an alternating bright and dark striation plasma. The adding of nitrogen can effectively quench metastable argon atoms and change the electron energy distribution function, which destroys the instability conditions of the plasma, therefore, the striation plasma disappears. This work provides a new insight into the understanding of the formation and annihilation mechanism of glow discharge striation plasma at high pressure.
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Keywords:
- glow discharges /
- striation plasmas /
- ionization instability /
- ionization wave /
- optical emission spectrometry.
[1] Bogaerts A 1999 J. Anal. At. Spectrom. 14 1375Google Scholar
[2] Kiselev A S, Menshchikova V V, Seyfulina N A, Smirnov E A 2019 J. Phys. Conf. Ser. 1313 012030Google Scholar
[3] Long L, Zhou W X, Tang J F, Zhou D S 2020 Plasma Process. Polym. 17 1900242Google Scholar
[4] Ezhovskii Y K, Mikhailovskii S V 2019 Russ. Microelectron. 48 229Google Scholar
[5] Raizer Y P 1991 Gas Discharge Physics (Berlin: Springer) p230
[6] Kolobov V I 2006 J. Phys. D Appl. Phys. 39 R487Google Scholar
[7] Pollard W, Suzuki P, Staack D 2014 IEEE Trans. Plasma Sci. 42 2650Google Scholar
[8] Mulders H C J, Brok W J M, Stoffels W W 2008 IEEE Trans. Plasma Sci. 36 1380Google Scholar
[9] Mahamud R, Farouk T, Kolobov V 2017 The 44th International Conference on Plasma Science Atlantic City, American, May 21–24, 2017
[10] Lisovskiy V A, Koval V A, Artushenko E P, Yegorenkov V D 2012 V Eur. J. Phys. 33 1537
[11] Keys D A, Heard J F 1930 Nature 125 971Google Scholar
[12] Tsendin L D 2009 Plasma Sources Sci. Technol. 18 014020Google Scholar
[13] Novák M 1960 Czech. J. Phys. B 10 954Google Scholar
[14] Zhu W Y, Cui R L, He F, Wang Y Q, Ouyang J T 2021 Phys. Plasmas 28 113502Google Scholar
[15] Levko D 2021 Phys. Plasmas 28 013506Google Scholar
[16] Golubovskii Y B, Nekuchaev V O, Skoblo A Y 2014 Tech. Phys. 59 1787Google Scholar
[17] Golubovskii Y, Gurkova T, Valin S 2021 Plasma Sources Sci. Technol. 30 115001Google Scholar
[18] Godyak V A, Alexandrovich B M, Kolobov V I 2019 Phys. Plasmas 26 033504Google Scholar
[19] 王建龙, 丁芳, 朱晓东 2015 物理学报 64 045206Google Scholar
Wang J L, Ding F, Zhu X D 2015 Acta Phys. Sin. 64 045206Google Scholar
[20] Shkurenkov I A, Mankelevich Y A, Rakhimova T V 2009 Phys. Rev. E 79 046406Google Scholar
[21] Golubovskii Y, Valin S, Pelyukhova E, Nekuchaev V 2019 Plasma Sources Sci. Technol. 28 45015Google Scholar
[22] Golubovskii Y B, Siasko A V, Kalanov D V, Nekuchaev V O 2018 Plasma Sources Sci. Technol. 27 085009Google Scholar
[23] Hodgman S S, Dall R G, Byron L J, Baldwin K G H, Buckman S J, Truscott A G 2009 Phys. Rev. Lett. 103 053002Google Scholar
[24] Johnston P D, 1971 Phys. Lett. A 34 389
[25] Siefert N S, Sands B L, Ganguly B N 2006 Appl. Phys. Lett. 89 011502Google Scholar
[26] Yamada H, Kato S, Shimizu T, Fujiwara M, Fujiwara Y, Kim J, Ikehara S, Shimizu N, Ikehara Y, Sakakita H 2020 Phys. Plasmas 27 022107Google Scholar
[27] Morgan W L, Childs M W 2015 Plasma Sources Sci. Technol. 24 55022Google Scholar
[28] Liu Y X, Schüngel E, Korolov I, Donkó Z, Wang Y N, Schulze J 2016 Phys. Rev. Lett. 116 255002Google Scholar
[29] Iza F, Hopwood J A 2005 IEEE Trans. Plasma Sci. 33 306Google Scholar
[30] Zhu H, Su Z, Dong Y 2017 Appl. Phys. Lett. 111 054104Google Scholar
[31] Golubovskii Yu B, Siasko A V, Nekuchaev V O 2020 Plasma Sources Sci. Technol. 29 065020Google Scholar
[32] Kabouzi Y, Calzada M D, Moisan M, Tran K C, Trassy C 2002 J. Appl. Phys. 91 1008Google Scholar
[33] Czerwiec T, Graves D B 2004 J. Phys. D: Appl. Phys. 37 2827Google Scholar
[34] Kawamura E, Lieberman M A, Lichtenberg A J 2019 Phys. Plasmas 26 093506Google Scholar
[35] Kawamura E, Lieberman M A, Lichtenberg A J 2016 Plasma Sources Sci. Technol. 25 054009Google Scholar
[36] 格兰特 著 (马腾才, 秦运文 译) 等离子体物理基础 (北京: 原子能出版社) 第258 —265页
Голант В Е(translated by Ma T C, Qin Y W) 1983 Fundamentals of Plasma Physics (Beijing: Atomic Energy Press) pp258–265 (in Chinese)
[37] Böhle A, Ivanov O, Kolisko A, Kortshagen U, Schlüter H, Vikharev A 1996 J. Phys. D: Appl. Phys. 29 369Google Scholar
[38] Dyatko N A, Ionikh Y Z, Kochetov I V, Marinov D L, Meshchanov A V, Napartovich A P, Petrov F B, Starostin S A 2008 J. Phys. D. Appl. Phys. 41 055204Google Scholar
[39] Hong Y C, Uhm H S, Yi W J 2008 Appl. Phys. Lett. 93 051504Google Scholar
[40] Masoud N, Martus K, Becker K 2005 J. Phys. D: Appl. Phys. 38 1674Google Scholar
[41] Liu K, Xia H T, Yang M H, Geng W Q, Zuo J, Ostrikov K 2022 Vacuum 198 110901Google Scholar
[42] Tvarog D, Olejníček J, Kratochvíl J, Kšírová P, Poruba A, Hubička Z, Čada M 2021 J. Appl. Phys. 130 013301Google Scholar
[43] Kang N, Gaboriau F, Oh S, Ricard A 2011 Plasma Sources Sci. Technol. 20 045015Google Scholar
[44] Hayashi M 1982 J. Phys. D: Appl. Phys. 15 1411Google Scholar
[45] Petrov G M, Boris D R, Petrova T B, Lock E H, Fernsler R F, Walton S G 2013 Plasma Sources Sci. Technol. 22 065005Google Scholar
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图 3 (a) 氩气辉纹放电图像, 电极间距为10 mm, 气压为21.22 kPa, 曝光时间为1/200 s; (b) 辉纹边缘检测图像; (c) 辉纹灰度值分布
Figure 3. (a) Typical image of argon striation plasmas in electrode spacing of 10 mm and gas pressure of 21.22 kPa, within exposure time of 1/200 s; (b) image edge detection of striation; (c) gray distribution of striation plasmas.
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[1] Bogaerts A 1999 J. Anal. At. Spectrom. 14 1375Google Scholar
[2] Kiselev A S, Menshchikova V V, Seyfulina N A, Smirnov E A 2019 J. Phys. Conf. Ser. 1313 012030Google Scholar
[3] Long L, Zhou W X, Tang J F, Zhou D S 2020 Plasma Process. Polym. 17 1900242Google Scholar
[4] Ezhovskii Y K, Mikhailovskii S V 2019 Russ. Microelectron. 48 229Google Scholar
[5] Raizer Y P 1991 Gas Discharge Physics (Berlin: Springer) p230
[6] Kolobov V I 2006 J. Phys. D Appl. Phys. 39 R487Google Scholar
[7] Pollard W, Suzuki P, Staack D 2014 IEEE Trans. Plasma Sci. 42 2650Google Scholar
[8] Mulders H C J, Brok W J M, Stoffels W W 2008 IEEE Trans. Plasma Sci. 36 1380Google Scholar
[9] Mahamud R, Farouk T, Kolobov V 2017 The 44th International Conference on Plasma Science Atlantic City, American, May 21–24, 2017
[10] Lisovskiy V A, Koval V A, Artushenko E P, Yegorenkov V D 2012 V Eur. J. Phys. 33 1537
[11] Keys D A, Heard J F 1930 Nature 125 971Google Scholar
[12] Tsendin L D 2009 Plasma Sources Sci. Technol. 18 014020Google Scholar
[13] Novák M 1960 Czech. J. Phys. B 10 954Google Scholar
[14] Zhu W Y, Cui R L, He F, Wang Y Q, Ouyang J T 2021 Phys. Plasmas 28 113502Google Scholar
[15] Levko D 2021 Phys. Plasmas 28 013506Google Scholar
[16] Golubovskii Y B, Nekuchaev V O, Skoblo A Y 2014 Tech. Phys. 59 1787Google Scholar
[17] Golubovskii Y, Gurkova T, Valin S 2021 Plasma Sources Sci. Technol. 30 115001Google Scholar
[18] Godyak V A, Alexandrovich B M, Kolobov V I 2019 Phys. Plasmas 26 033504Google Scholar
[19] 王建龙, 丁芳, 朱晓东 2015 物理学报 64 045206Google Scholar
Wang J L, Ding F, Zhu X D 2015 Acta Phys. Sin. 64 045206Google Scholar
[20] Shkurenkov I A, Mankelevich Y A, Rakhimova T V 2009 Phys. Rev. E 79 046406Google Scholar
[21] Golubovskii Y, Valin S, Pelyukhova E, Nekuchaev V 2019 Plasma Sources Sci. Technol. 28 45015Google Scholar
[22] Golubovskii Y B, Siasko A V, Kalanov D V, Nekuchaev V O 2018 Plasma Sources Sci. Technol. 27 085009Google Scholar
[23] Hodgman S S, Dall R G, Byron L J, Baldwin K G H, Buckman S J, Truscott A G 2009 Phys. Rev. Lett. 103 053002Google Scholar
[24] Johnston P D, 1971 Phys. Lett. A 34 389
[25] Siefert N S, Sands B L, Ganguly B N 2006 Appl. Phys. Lett. 89 011502Google Scholar
[26] Yamada H, Kato S, Shimizu T, Fujiwara M, Fujiwara Y, Kim J, Ikehara S, Shimizu N, Ikehara Y, Sakakita H 2020 Phys. Plasmas 27 022107Google Scholar
[27] Morgan W L, Childs M W 2015 Plasma Sources Sci. Technol. 24 55022Google Scholar
[28] Liu Y X, Schüngel E, Korolov I, Donkó Z, Wang Y N, Schulze J 2016 Phys. Rev. Lett. 116 255002Google Scholar
[29] Iza F, Hopwood J A 2005 IEEE Trans. Plasma Sci. 33 306Google Scholar
[30] Zhu H, Su Z, Dong Y 2017 Appl. Phys. Lett. 111 054104Google Scholar
[31] Golubovskii Yu B, Siasko A V, Nekuchaev V O 2020 Plasma Sources Sci. Technol. 29 065020Google Scholar
[32] Kabouzi Y, Calzada M D, Moisan M, Tran K C, Trassy C 2002 J. Appl. Phys. 91 1008Google Scholar
[33] Czerwiec T, Graves D B 2004 J. Phys. D: Appl. Phys. 37 2827Google Scholar
[34] Kawamura E, Lieberman M A, Lichtenberg A J 2019 Phys. Plasmas 26 093506Google Scholar
[35] Kawamura E, Lieberman M A, Lichtenberg A J 2016 Plasma Sources Sci. Technol. 25 054009Google Scholar
[36] 格兰特 著 (马腾才, 秦运文 译) 等离子体物理基础 (北京: 原子能出版社) 第258 —265页
Голант В Е(translated by Ma T C, Qin Y W) 1983 Fundamentals of Plasma Physics (Beijing: Atomic Energy Press) pp258–265 (in Chinese)
[37] Böhle A, Ivanov O, Kolisko A, Kortshagen U, Schlüter H, Vikharev A 1996 J. Phys. D: Appl. Phys. 29 369Google Scholar
[38] Dyatko N A, Ionikh Y Z, Kochetov I V, Marinov D L, Meshchanov A V, Napartovich A P, Petrov F B, Starostin S A 2008 J. Phys. D. Appl. Phys. 41 055204Google Scholar
[39] Hong Y C, Uhm H S, Yi W J 2008 Appl. Phys. Lett. 93 051504Google Scholar
[40] Masoud N, Martus K, Becker K 2005 J. Phys. D: Appl. Phys. 38 1674Google Scholar
[41] Liu K, Xia H T, Yang M H, Geng W Q, Zuo J, Ostrikov K 2022 Vacuum 198 110901Google Scholar
[42] Tvarog D, Olejníček J, Kratochvíl J, Kšírová P, Poruba A, Hubička Z, Čada M 2021 J. Appl. Phys. 130 013301Google Scholar
[43] Kang N, Gaboriau F, Oh S, Ricard A 2011 Plasma Sources Sci. Technol. 20 045015Google Scholar
[44] Hayashi M 1982 J. Phys. D: Appl. Phys. 15 1411Google Scholar
[45] Petrov G M, Boris D R, Petrova T B, Lock E H, Fernsler R F, Walton S G 2013 Plasma Sources Sci. Technol. 22 065005Google Scholar
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