Mechanisms and research progress in process control of inductively coupled plasma etching

ZHANG Man; TAO Jianhe; HE Ming; QIAN Lirong; MA Lei

doi:10.7498/aps.75.20260097

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中国物理学会期刊

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ZHANG Man, TAO Jianhe, HE Ming, QIAN Lirong, MA Lei. Mechanisms and research progress in process control of inductively coupled plasma etching. Acta Physica Sinica, 2026, 75(15): 150507. DOI: 10.7498/aps.75.20260097

Citation:

ZHANG Man, TAO Jianhe, HE Ming, QIAN Lirong, MA Lei. Mechanisms and research progress in process control of inductively coupled plasma etching. Acta Physica Sinica, 2026, 75(15): 150507. DOI: 10.7498/aps.75.20260097

Citation:

ZHANG Man, TAO Jianhe, HE Ming, QIAN Lirong, MA Lei. Mechanisms and research progress in process control of inductively coupled plasma etching. Acta Physica Sinica, 2026, 75(15): 150507. DOI: 10.7498/aps.75.20260097