INFRARED ABSORPTION OF OXYGEN IN SILICON AND GERMANIUM AT LOW TEMPERATURES
Acta Physica Sinica
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Acta Phys. Sin.  1980, Vol. 29 Issue (7): 867-877    
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INFRARED ABSORPTION OF OXYGEN IN SILICON AND GERMANIUM AT LOW TEMPERATURES
Ye Yi-ying1, Li He-cheng2, Song Xiang-fang2, Xu Zhen-jia3, Chen Yu-zhang3, Jiang De-sheng3, Song Chun-ying3
(1)武汉大学物理系; (2)冶金工业部有色金属研究院; (3)中国科学院半导体研究所
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