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Chen Tao, Zhang Tao, Yin Yuan-Xiang, Xie Yu-Sha, Qiu Xiao-Yan. Tri-level resistive switching characteristics and conductive mechanism of HfO2/NiOx/HfO2 stacksJ. Acta Physica Sinica, 2023, 72(14): 148401. DOI: 10.7498/aps.72.20230331
Citation: Chen Tao, Zhang Tao, Yin Yuan-Xiang, Xie Yu-Sha, Qiu Xiao-Yan. Tri-level resistive switching characteristics and conductive mechanism of HfO2/NiOx/HfO2 stacksJ. Acta Physica Sinica, 2023, 72(14): 148401. DOI: 10.7498/aps.72.20230331
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Tri-level resistive switching characteristics and conductive mechanism of HfO2/NiOx/HfO2 stacks

Acta Phys. Sin., 2023, 72(14): 148401.
DOI: 10.7498/aps.72.20230331
CSTR: 32037.14.aps.72.20230331
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