Metal contamination in process line of superconducting quantum processor chips

XU Xiao; ZHANG Haibin; SU Feifan; YAN Kai; RONG Hao; DENG Hui; YANG Xinying; MA Xiaoteng; DONG Xue; WANG Qiming; LIU Jialin; LI Manman

doi:10.7498/aps.75.20251101

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XU Xiao, ZHANG Haibin, SU Feifan, YAN Kai, RONG Hao, DENG Hui, YANG Xinying, MA Xiaoteng, DONG Xue, WANG Qiming, LIU Jialin, LI Manman. Metal contamination in process line of superconducting quantum processor chipsJ. Acta Physica Sinica, 2026, 75(1): 010601. DOI: 10.7498/aps.75.20251101

Citation:

XU Xiao, ZHANG Haibin, SU Feifan, YAN Kai, RONG Hao, DENG Hui, YANG Xinying, MA Xiaoteng, DONG Xue, WANG Qiming, LIU Jialin, LI Manman. Metal contamination in process line of superconducting quantum processor chipsJ. Acta Physica Sinica, 2026, 75(1): 010601. DOI: 10.7498/aps.75.20251101

Citation:

XU Xiao, ZHANG Haibin, SU Feifan, YAN Kai, RONG Hao, DENG Hui, YANG Xinying, MA Xiaoteng, DONG Xue, WANG Qiming, LIU Jialin, LI Manman. Metal contamination in process line of superconducting quantum processor chipsJ. Acta Physica Sinica, 2026, 75(1): 010601. DOI: 10.7498/aps.75.20251101