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Roughness and light scattering properties of ZrO2 thin films deposited by electron beam evaporation

Shao Jian-Da Fan Zheng-Xiu Yi Kui Hou Hai-Hong Sun Xi-Lian Shen Yan-Ming

Roughness and light scattering properties of ZrO2 thin films deposited by electron beam evaporation

Shao Jian-Da, Fan Zheng-Xiu, Yi Kui, Hou Hai-Hong, Sun Xi-Lian, Shen Yan-Ming
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  • Received Date:  20 July 2005
  • Accepted Date:  12 December 2005
  • Published Online:  20 June 2006

Roughness and light scattering properties of ZrO2 thin films deposited by electron beam evaporation

  • 1. (1)中国科学院上海光学精密机械研究所,上海 201800; (2)中国科学院上海光学精密机械研究所,上海 201800;中国科学院研究生院,北京 100039

Abstract: Zirconium oxide (ZrO2) coatings for 632.8nm center wavelength were deposited on the Ag layer by electron beam evaporation, optical thickness of which varied in the range of 80—480nm. Surface roughness and scattering characteristics of ZrO2 coatings with different thickness were investigated. It was found that with the gradually increase of the thickness, both roughness and total integrated scattering (TIS) of the samples decreased firstly and then increased. These results indicated that TIS of the samples mainly depended on the surface roughness. According to the uncorrelated surface roughness scattering model, scattering properties of the samples were analyzed theoretically. The calculated TIS values based on this model agreed well with that obtained by TIS measurements.

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