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KINK INSTABILITIES OF A SHARP BOUNDARY PLASMA WITH SMALL ASPECT RATIO

GU YONG-NIAN

Chen Xiao-Liang, Sun Wei-Feng. Radiation hardening by process technology for high voltage nMOSFET in 180 nm embeded flash process. Acta Phys. Sin., 2022, 71(23): 236102. doi: 10.7498/aps.71.20221172
Citation: Chen Xiao-Liang, Sun Wei-Feng. Radiation hardening by process technology for high voltage nMOSFET in 180 nm embeded flash process. Acta Phys. Sin., 2022, 71(23): 236102. doi: 10.7498/aps.71.20221172

KINK INSTABILITIES OF A SHARP BOUNDARY PLASMA WITH SMALL ASPECT RATIO

GU YONG-NIAN
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  • Received Date:  06 May 1983
  • Published Online:  05 February 1984

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