Influence of addifion of electronegative gases on the properties of capacitively coupled Ar plasmas
Acta Physica Sinica
Citation Search Quick Search
Acta Phys. Sin  2013, Vol. 62 Issue (11): 115202     doi:10.7498/aps.62.115202
PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES Current Issue| Archive| Adv Search  |   
Influence of addifion of electronegative gases on the properties of capacitively coupled Ar plasmas
Hong Bu-Shuang1, Yuan Tao1, Zou Shuai1 2, Tang Zhong-Hua1, Xu Dong-Sheng1, Yu Yi-Qing1, Wang Xu-Sheng2, Xin Yu1
1. Provincial Key Laboratory of Thin Films, School of Physical Science and Technology, Soochow University, Suzhou 215006, China;
2. Canadian Solar Inc. Suzhou 215011, China
Copyright © Acta Physica Sinica
Address: Institute of Physics, Chinese Academy of Sciences, P. O. Box 603,Beijing 100190 China
Tel: 010-82649294,82649829,82649863   E-mail: aps8@iphy.ac.cn