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测量了在多孔硅形成初期阶段的电流I-电压V曲线,计算了硅表面原子吸附不同元素时电荷的转移量.指出在(单晶硅/电解液)界面处存在一电偶层,它影响着多孔硅材料的形成和性质.讨论了制备中氢氟酸(HF)浓度、电流密度和光照等因素对材料形成的影响.The I-V curves of the initial stage of porous silicon formation have been measured, and the amount of charge transfer for silicon atoms adsorbed different elements has been calculated. It was pointed out that there would exist a dipole layer at c-Si/electrolyte interface, which affected the formation and properties of porous silicon. The effects of HF concentration, current density and light illumination on material formation were also discussed.
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