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NiFe/Mo多层膜界面的电子显微学研究

高义华 张 泽 阎明朗 赖武彦

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NiFe/Mo多层膜界面的电子显微学研究

高义华, 张 泽, 阎明朗, 赖武彦

HREM STUDY OF THE INTERFACIAL STRUCTURE OF NiFe/Mo MAGNETIC MULTILAYERS

GAO YI-HUA, ZHANG ZE, YAN MING-LANG, LAI WU-YAN
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  • 用高分辨电子显微学方法研究了Ni80Fe20/Mo磁性多层膜,结果表明:(1)多层膜的结晶状态,随Mo非磁性层厚度而变化.当Mo层厚度为0.7nm时,多层膜基本为非晶;当Mo层厚度大于1.6nm时,Mo层和NiFe层内分别结晶为体心立方和面心立方多晶,层内晶粒尺寸为2—6nm.(2)在Mo层厚度为1.6和2.1nm的多层膜中,NiFe层和Mo层之间存在两种取向关系:(110)Mo∥(111)NiFe,[111]
    The [(Ni80Fe20)1.4nm/Moxnm]30 magnetic multilayers(x=0.7,1.6,2.1) have been investigated by selected area electron diffraction and high resolution electron microscopy (HREM).It is revealed that:(a) The structure of the NiFe/Mo multilayer changes with the increase of the thickness of Mo spacer-layer. The NiFe and Mo layers are mainly amorphous as the Mo spacer is 0.7 nm in thickness, and crystallized into polycrystalline fcc NiFe and bcc Mo layers as the Mo spacer is thicker than 1.6nm. (b) For the multilayers with Mo spacer of 1.6nm and 2.1nm in thickness , there are two types of orientation relationship between the fcc NiFe and bcc Mo:(110)Mo∥(111)NiFe,[111]Mo∥[110]NiFeand(110)Mo∥(111)NiFe,[001]Mo∥[110]NiFe.(c) The NiFe /Mo interfaces are sharp in case (b) but the lattice spacing varies near the interface region as the lattice spacing of NiFe expands and that of Mo contracts with respect to their bulk counterparts. The variation of lattice spacing near the interfacial region has been discussed and the absence of giant magneto-resistance has been interpreted by the structural characteristics of the multilayers.
    • 基金项目: 中国科学院基金和国家自然科学基金资助的课题.
  • [1] 朱孝先, 高亦谈, 王羡之, 王一鸣, 王佶, 王兆华, 赵昆, 魏志义. 阿秒脉冲串产生和相位信息重构的对比研究. 物理学报, 2024, 0(0): . doi: 10.7498/aps.73.20240292
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  • 被引次数: 0
出版历程
  • 收稿日期:  1997-12-15
  • 刊出日期:  1998-05-20

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