Measurement of thickness and refractive index of Zn1-xMgxO film grown on sapphire substrate by molecular beam epitaxy

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Abstract
The thickness and refractive index of Zn1-xMgxO film grown on A-sapphire substrate by molecular beam epitaxy were measured by ellipsometry. Combined with Mg content measured by inductively coupled plasma (ICP), the curves showing the relationships of thickness with film growth condition and the refractive index with the Mg content in the film were deduced by numerical analysis, which may serve as a theoretical basis for controlling the thickness and the refractive index in Zn1-xMgxO film growth process.

Keywords:
ZnMgO film /

ellipsometry /

refractive index /

molecular beam epitaxy (MBE)
Authors and contacts
Yan Feng-Ping⁵,

Zheng Kai⁴,

Wang Lin⁴,

Li Yi-Fan⁴,

Gong Tao-Rong⁴,

Jian Shui-Sheng⁴,

K. Ogata¹,

K. Koike²,

S. Sasa³,

M. Inoue³,

M. Yano³

(1)Bio Venture Center,Osaka Institute of Technology; (2)New Material Research Center,Osaka Institute of Technology; (3)New Material Research Center,Osaka Institute of Technology;Bio Venture Center,Osaka Institute of Technology; (4)北京交通大学光波技术研究所，北京 100044; (5)北京交通大学光波技术研究所，北京 100044;New Material Research Center,Osaka Institute of Technology
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