Search

Article

x

留言板

尊敬的读者、作者、审稿人, 关于本刊的投稿、审稿、编辑和出版的任何问题, 您可以本页添加留言。我们将尽快给您答复。谢谢您的支持!

姓名
邮箱
手机号码
标题
留言内容
验证码

MONTE CARLO CALCULATION ON THE MEASUREMENT OF THICKNESS OF THIN FILMS IN MICRO-DOMAIN

HE YAN-CAI HUANG YUE-HONG SUN JING CHEN YU-SAN

MONTE CARLO CALCULATION ON THE MEASUREMENT OF THICKNESS OF THIN FILMS IN MICRO-DOMAIN

HE YAN-CAI, HUANG YUE-HONG, SUN JING, CHEN YU-SAN
PDF
Get Citation

(PLEASE TRANSLATE TO ENGLISH

BY GOOGLE TRANSLATE IF NEEDED.)

Metrics
  • Abstract views:  2529
  • PDF Downloads:  644
  • Cited By: 0
Publishing process
  • Received Date:  12 January 1981
  • Published Online:  27 July 2005

MONTE CARLO CALCULATION ON THE MEASUREMENT OF THICKNESS OF THIN FILMS IN MICRO-DOMAIN

  • 1. (1)中国科学院上海硅酸盐研究所; (2)中国科学院上海冶金研究所

Abstract: Monte Carlo method has been used to evaluate the X-ray intensity distribution funetion in freestanding thin films and in surface layer of same thickness of the same material. A simple equation of the X-ray emitting intensity from a thin film on substrate has been proposed to correct the influence of Z. A. P. on the determination of film thickness. The accuracy of the present measurement is higher than that of methods previously. developed. Experimental results are presented for Ta2O5 film on GaAs and for ZrO2 on Si. They are in agreement with those obtained by ellipsometry.

Catalog

    /

    返回文章
    返回