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A study of LED with surface photonic crystal structure fabricated by the nanoimprint lithography

Peng Jing Xu Zhi-Mou Wu Xiao-Feng Sun Tang-You

A study of LED with surface photonic crystal structure fabricated by the nanoimprint lithography

Peng Jing, Xu Zhi-Mou, Wu Xiao-Feng, Sun Tang-You
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  • Abstract views:  1669
  • PDF Downloads:  1288
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  • Received Date:  15 June 2012
  • Accepted Date:  24 August 2012
  • Published Online:  05 February 2013

A study of LED with surface photonic crystal structure fabricated by the nanoimprint lithography

  • 1. College of Sciences, Wuhan University of Science and Technology, Wuhan 430081, China;
  • 2. School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan 430074, China
Fund Project:  Project supported by the National Natural Science Foundation of China (Grant Nos. 61076042, 60607006), the Special Project on Development of National Key Scientific Instruments and Equipment of China (Grant No. 2011YQ16000205) and the National High Technology Research and Development Program of China (2011AA03A106).

Abstract: Surface photonic crystal (PC) structure can improve the external quantum efficiency of light-emitting diode (LED). However, it is very difficult to fabricate large area and uniform nanometer photonic crystal structure in this field. In this paper, two-dimensional PC with hole-like structure is successfully transferred to the surface of gallium nitride LED (GaN-LED) by the mental-polymer double-layer mask dry etching technology combined with the nanoimprint lithography. The large area nanometer PC patterns with pore diameter of 240 nm and period of 450 nm are obtained. The results show that the photoluminescence peak intensity of LED with the PC structure is 7.2 times higher than that of the conventional LED.

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