ATOM LITHOGRAPHY

CAI WEI-QUAN; LI CHUAN-WEN; HUO YUN-SHENG; WANG YU-ZHU

doi:10.7498/aps.48.611

Abstract
A new nanometer lithographic techniqueatom lithography,which is developed based on the principles of laser cooling and trapping of neutral atomsthe newest achievements of quantum optics,has been reviewed.The working principles,the overall schemes,the individual techniques and the acquired results are described.This new method has been compared with the existing micro-lithographic techniques,and the application potentialities in the micro-electronics and other fields have been discussed.
Authors and contacts
CAI WEI-QUAN,

LI CHUAN-WEN,

HUO YUN-SHENG,

WANG YU-ZHU

1.
中国科学院上海光学精密机械研究所量子光学开放研究实验室，上海 201800
References

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Vol. 48, Issue 4 - 1999-02-20

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