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Influences of deposition rate and oxygen partial pressure on residual stress of HfO2 films

Cen Min Zhang Yue-Guang Chen Wei-Lan Gu Pei-Fu

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Influences of deposition rate and oxygen partial pressure on residual stress of HfO2 films

Cen Min, Zhang Yue-Guang, Chen Wei-Lan, Gu Pei-Fu
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  • Abstract views:  7159
  • PDF Downloads:  987
  • Cited By: 0
Publishing process
  • Received Date:  17 November 2008
  • Accepted Date:  03 February 2009
  • Published Online:  05 May 2009

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